The emitter formation in industrial p-type silicon solar cells is generally done by phosphorus diffusion. To optimize the emitter in terms of high efficiency, series resistance and recombination losses of the emitter are balanced out. In this work, we present the results of a design of experiment (DoE) to optimize the main parameters of the P-diffusion. Therefore, we use a novel approach to evaluate the results of the DoE: We approximate the unavoidable correlation between the emitter saturation current density (j0e) and the emitter sheet resistance (ρsh) and create a new target variable (dj0e), which describes the deviation from this correlation. This allows us to understand the key parameters that can minimize emitter saturation current d...
In order to increase the conversion efficiencies of silicon solar cells, advanced cell structures wi...
The advances in contact formation of screen printed Ag pastes and the related progress in emitter pr...
The Doped Oxide Solid Source (DOSS) diffusion technique is well suited for fine-tuning of the surfac...
The emitter formation in industrial p-type silicon solar cells is generally done by phosphorus diffu...
International audienceThe main purpose of this work is to demonstrate the possibility of diffusion p...
Abstract: The emitter formation constitutes a crucial step in the manufacturing of the crystalline s...
This work focuses on studying two types of structure: homogeneous and double-diffused emitter silico...
In this work the influence of varied diffusion parameters for an industrial open tube POCl3 diffusio...
In this work, we present an analysis on electrical performance of phosphorus diffused emitters on bl...
Improving the efficiency of silicon (Si) solar cells relies on the understanding and optimization of...
Considering recent modifications on n-type highly doped silicon parameters, an emitter optimization ...
Increasing silicon solar cell efficiency plays a vital role in improving the dominant market share o...
The determination of suitable process parameters for POCl3 diffusion, with the aim of minimizing emi...
A systematic experimental study is presented that aims at the optimization of the emitter of high-ef...
N-type emitters have been formed in p-type monocrystalline silicon with good uniformity and high pea...
In order to increase the conversion efficiencies of silicon solar cells, advanced cell structures wi...
The advances in contact formation of screen printed Ag pastes and the related progress in emitter pr...
The Doped Oxide Solid Source (DOSS) diffusion technique is well suited for fine-tuning of the surfac...
The emitter formation in industrial p-type silicon solar cells is generally done by phosphorus diffu...
International audienceThe main purpose of this work is to demonstrate the possibility of diffusion p...
Abstract: The emitter formation constitutes a crucial step in the manufacturing of the crystalline s...
This work focuses on studying two types of structure: homogeneous and double-diffused emitter silico...
In this work the influence of varied diffusion parameters for an industrial open tube POCl3 diffusio...
In this work, we present an analysis on electrical performance of phosphorus diffused emitters on bl...
Improving the efficiency of silicon (Si) solar cells relies on the understanding and optimization of...
Considering recent modifications on n-type highly doped silicon parameters, an emitter optimization ...
Increasing silicon solar cell efficiency plays a vital role in improving the dominant market share o...
The determination of suitable process parameters for POCl3 diffusion, with the aim of minimizing emi...
A systematic experimental study is presented that aims at the optimization of the emitter of high-ef...
N-type emitters have been formed in p-type monocrystalline silicon with good uniformity and high pea...
In order to increase the conversion efficiencies of silicon solar cells, advanced cell structures wi...
The advances in contact formation of screen printed Ag pastes and the related progress in emitter pr...
The Doped Oxide Solid Source (DOSS) diffusion technique is well suited for fine-tuning of the surfac...