Surface structure studies of GaAs(100) with and without chemical passivation have been made using atomic force microscopy (AFM). Passivation was carried out using a solution of SeS2 which has proved to be a successful passivating agent as seen from the increase in the photoluminescence (PL) intensity. Atomic force microscopy results indicate that it is possible to obtain ordered surface layers on GaAs using SeS2
Particle-induced X-ray emission measurements combined with Rutherford backscattering spectrometry (i...
In this paper, we discuss the preparation of GaAs crystal surfaces by me-chanical and chemical techn...
The effectiveness of chemical surface treatment of GaAs using (NH4)2Sx, Na2S and RuCl3 has been stud...
The morphology and chemistry of S-treated GaAs(001) surfaces have been investigated by using an atom...
We have examined passivated and unpassivated GaAs (110) surfaces under ambient conditions with Scann...
We report on a new Se chemical passivation [(NH4)2S + Se] for GaAs surfaces. We compare our Se passi...
Many techniques for high-resolution surface analysis of semiconductors are known, such as optical-, ...
The passivation effects of the SF6 plasma on a GaAs surface has been investigated by using the radio...
Surface properties of GaAs passivated with (NH4)(2)S-x solution have been analyzed in GaAs wafer and...
A study of the adsorption of sulfur on the GaAs(100) surface after in situ thermal desorption of a p...
Surface properties of GaAs (001) cleaned with H3PO4 or HCl solutions and passivated with (NH4)(2)S-x...
[[abstract]]A new surface passivation technique using P2S5/(NH4)2S on GaAs Schottky barrier diodes f...
This report summarizes the results accomplished during the funding period of this grant (June 1, 199...
A promising chemical surface preparation technique, which consists in the treatment of GaAs(1 0 0) i...
5 páginas, 5 figuras, 1 tabla.-- PACS: 81.65.Rv, 68.37.Ef, 68.37.Ps, 81.65.Cf, 68.47.Fg, 68.55.A-Gro...
Particle-induced X-ray emission measurements combined with Rutherford backscattering spectrometry (i...
In this paper, we discuss the preparation of GaAs crystal surfaces by me-chanical and chemical techn...
The effectiveness of chemical surface treatment of GaAs using (NH4)2Sx, Na2S and RuCl3 has been stud...
The morphology and chemistry of S-treated GaAs(001) surfaces have been investigated by using an atom...
We have examined passivated and unpassivated GaAs (110) surfaces under ambient conditions with Scann...
We report on a new Se chemical passivation [(NH4)2S + Se] for GaAs surfaces. We compare our Se passi...
Many techniques for high-resolution surface analysis of semiconductors are known, such as optical-, ...
The passivation effects of the SF6 plasma on a GaAs surface has been investigated by using the radio...
Surface properties of GaAs passivated with (NH4)(2)S-x solution have been analyzed in GaAs wafer and...
A study of the adsorption of sulfur on the GaAs(100) surface after in situ thermal desorption of a p...
Surface properties of GaAs (001) cleaned with H3PO4 or HCl solutions and passivated with (NH4)(2)S-x...
[[abstract]]A new surface passivation technique using P2S5/(NH4)2S on GaAs Schottky barrier diodes f...
This report summarizes the results accomplished during the funding period of this grant (June 1, 199...
A promising chemical surface preparation technique, which consists in the treatment of GaAs(1 0 0) i...
5 páginas, 5 figuras, 1 tabla.-- PACS: 81.65.Rv, 68.37.Ef, 68.37.Ps, 81.65.Cf, 68.47.Fg, 68.55.A-Gro...
Particle-induced X-ray emission measurements combined with Rutherford backscattering spectrometry (i...
In this paper, we discuss the preparation of GaAs crystal surfaces by me-chanical and chemical techn...
The effectiveness of chemical surface treatment of GaAs using (NH4)2Sx, Na2S and RuCl3 has been stud...