Nanoscale precision in ion milling for optical and terahertz antennas

Plasmonics and nanoscale antennas have been intensively investigated for sensors, metasurfaces and optical trapping where light control at the nanoscale enables new functionalities. To confine and manipulate the light in tiny spaces sub-wavelength antennas should be used with dimensions from micro- to nano-meters and are still challenging to make. Direct fabrication/modification of nanostructures using focused ion beam (FIB) milling is demonstrated for several types of antennas. Arrays of identical nanoparticles were fabricated in a single step by (i) milling gold films or (ii) by modifying structures which were already defined by electron beam or mask projection lithography. Direct FIB writing enables to exclude resist processing steps, thus making fabrication faster and simpler. Sensor areas of 25x25 μm2 of densely packed nanoparticles separated by tens-of-nanometers were fabricated in half an hour (103 μm2/h throughput at 90 nm resolution). Patterns of chiral nanoparticles by groove inscription is demonstrated. The processing speed and capability to mill complex 3D surfaces due to depth of focus not compromised over micrometers length, makes it possible to reach sub-50 nm resolution of direct write. FIB technology is practical for emerging applications in nano-fabrication/photonic/fluidic/magnetic applications