Optimization of (i) intensity of illumination and (ii) thickness of resist was made looking for the conditions when high spatial resolution could be achieved by optical near- field lithography. Standard set-up of near-field illumination through a tapered Al-coated fiber tip was employed for the exposure of positive resist OFPR-5000 (EG), which is photo-sensitive for wavelength (lambda) > 450 nm. Tip was scanned along the line at near-field conditions of constant sample-to-tip separation to produce adjustable exposure dose of the spin-coated resist film. Femtosecond, 120 fs, pulses of the power P >1 mW (at 82 MHz repetition rate) at 400 nm were coupled into a fiber (>1 m length) and delivered to the surface of the resist for illumination. Th...
Concepts of optical resolution limits have been transformed in the past two decades with the develop...
This chapter reviews a specific application of scanning near-field optical microscopy (SNOM) to lith...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
The potential use of optical near-field techniques for lithographic purposes is reviewed. After a br...
A new resist formulation was successfully patterned using near field optical microscopy in order to ...
This article describes two- and three-dimensional optical simulations for determining optimal condit...
This article describes two- and three-dimensional optical simulations for determining optimal condit...
AbstractWe demonstrate the near-field scanning optical microscope (NSOM) lithography in the non-cont...
We discuss the influence of lateral fiber vibrations on the lateral resolution in scanning near fiel...
We show that lateral resolution well beyond 100 nm can be obtained in scanning near-field optical mi...
Line nanopatterns are produced on the positive photoresist by scanning near-field optical microscope...
Near-field scanning optical microscopy (NSOM) is one of the most recent scanning probe techniques. I...
Nearfield scanning optical microscopy (NSOM) offers a practical means of optical imaging, optical se...
The diffraction limit is the major stumbling block in pushing optical lithography to feature sizes s...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
Concepts of optical resolution limits have been transformed in the past two decades with the develop...
This chapter reviews a specific application of scanning near-field optical microscopy (SNOM) to lith...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
The potential use of optical near-field techniques for lithographic purposes is reviewed. After a br...
A new resist formulation was successfully patterned using near field optical microscopy in order to ...
This article describes two- and three-dimensional optical simulations for determining optimal condit...
This article describes two- and three-dimensional optical simulations for determining optimal condit...
AbstractWe demonstrate the near-field scanning optical microscope (NSOM) lithography in the non-cont...
We discuss the influence of lateral fiber vibrations on the lateral resolution in scanning near fiel...
We show that lateral resolution well beyond 100 nm can be obtained in scanning near-field optical mi...
Line nanopatterns are produced on the positive photoresist by scanning near-field optical microscope...
Near-field scanning optical microscopy (NSOM) is one of the most recent scanning probe techniques. I...
Nearfield scanning optical microscopy (NSOM) offers a practical means of optical imaging, optical se...
The diffraction limit is the major stumbling block in pushing optical lithography to feature sizes s...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...
Concepts of optical resolution limits have been transformed in the past two decades with the develop...
This chapter reviews a specific application of scanning near-field optical microscopy (SNOM) to lith...
Developing a cost-effective nanolithography strategy that enables the production of subwavelength fe...