We report on wet etching of photomodified regions in crystalline sapphire using KOH solution. Tightly focused femtosecond laser pulses (150 fs at 800 nm wavelength) were used to create void structures enclosed in an amorphised sapphire shell inside the bulk of a crystalline host. The diameter of the amorphous regions can be controlled by pulse energy and was typically 0.5–1.5 µm. The etching rate depends on the distance between adjacent irradiation spots, pulse energy, concentration of etchant and ultrasonic agitation
International audienceControlling stress applied in glasses and transparent materials by ultrashort ...
International audienceControlling stress applied in glasses and transparent materials by ultrashort ...
We demonstrate a technique called “In volume Selective Laser Etching ” (ISLE) for fs laser mi-cro st...
This paper analyzes laser and etching parameters to fabricate open and continuous microchannels and ...
We report on structural characterization of sapphire photomodified by voids of sub-wavelength diamet...
We report on structural characterization of sapphire photomodified by voids of sub-wavelength diamet...
The effect of 1030nm single picosecond pulsed laser-induced modification of the bulk of crystalline ...
Synthetic crystalline sapphire is hard, transparent and inert to most chemical etchants. It is a pop...
Gedvinas Nemickas FABRICATION OF MICROSTRUCTURES IN SAPPHIRE BY FS-LASER IRRADIATION AND SELECTIVE E...
The main idea of this work was to fabricate three-dimensional structures in fused silica and sapphir...
Transparent and high-hardness materials have become the object of wide interest due to their optical...
The actual space-time dependent intensity distribution of a tightly focused (numerical aperture NA =...
The high-temperature annealing (1500°C for 15 min) of the shock-amorphized and compressed sapp...
We demonstrate the realization of sub-surface channels in sapphire prepared by ultraviolet picosecon...
The fabrication of microchannels and self-assembled nanostructures in the volume of sapphire was per...
International audienceControlling stress applied in glasses and transparent materials by ultrashort ...
International audienceControlling stress applied in glasses and transparent materials by ultrashort ...
We demonstrate a technique called “In volume Selective Laser Etching ” (ISLE) for fs laser mi-cro st...
This paper analyzes laser and etching parameters to fabricate open and continuous microchannels and ...
We report on structural characterization of sapphire photomodified by voids of sub-wavelength diamet...
We report on structural characterization of sapphire photomodified by voids of sub-wavelength diamet...
The effect of 1030nm single picosecond pulsed laser-induced modification of the bulk of crystalline ...
Synthetic crystalline sapphire is hard, transparent and inert to most chemical etchants. It is a pop...
Gedvinas Nemickas FABRICATION OF MICROSTRUCTURES IN SAPPHIRE BY FS-LASER IRRADIATION AND SELECTIVE E...
The main idea of this work was to fabricate three-dimensional structures in fused silica and sapphir...
Transparent and high-hardness materials have become the object of wide interest due to their optical...
The actual space-time dependent intensity distribution of a tightly focused (numerical aperture NA =...
The high-temperature annealing (1500°C for 15 min) of the shock-amorphized and compressed sapp...
We demonstrate the realization of sub-surface channels in sapphire prepared by ultraviolet picosecon...
The fabrication of microchannels and self-assembled nanostructures in the volume of sapphire was per...
International audienceControlling stress applied in glasses and transparent materials by ultrashort ...
International audienceControlling stress applied in glasses and transparent materials by ultrashort ...
We demonstrate a technique called “In volume Selective Laser Etching ” (ISLE) for fs laser mi-cro st...