The surface potential of GaAs is strongly modified in the presence of a high‐energy electron beam due to the creation of electron‐hole pairs in the depletion region and the subsequent drift of the holes to the surface where they neutralize surface states. This effect is modeled in terms of a parameter K=A∗T2/Ib(dE/dz)η, where Ib is the beam current density, A∗ is the effective Richardson constant, dE/dz is the beam energy loss per unit length, and η−1 is the average energy required to create an electron‐hole pair. For the sample studied here, an 0.25‐μm layer with n≂3×1017 cm−3, we obtain a value K≂(7.5±0.8)×104 cm at T=296 K and Ib=0.33 μA/cm2, which gives A∗≂0.44 A/cm2 K2. Although this value of A∗ is much lower than the theoretical estim...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Photoreflectance has been used to study the electronic properties of (100) GaAs surfaces exposed to ...
Hall scattering factors for electrons and holes in molecular beam epitaxial GaAs layers have been de...
The surface potential of GaAs is strongly modified in the presence of a high‐energy electron beam du...
Previous attempts to passivate the n‐type (100)GaAs surface have significantly reduced only the surf...
Molecular beam epitaxial GaAs layers of electron concentration 1.69×1017 cm−3, and various thickness...
A new model is presented for the description of the surface reconstruction of III-V semiconductors. ...
Molecular beam epitaxial GaAs layers of electron concentration 1.69×1017 cm−3, and various thickness...
A new model is presented for the description of the surface reconstruction of III-V semiconductors. ...
X‐ray photoelectron spectroscopic results show that molecular beam epitaxial GaAs grown at 200 °C ha...
We propose a method for the quantitative evaluation of electron-beam-induced current profiles measur...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Photoreflectance has been used to study the electronic properties of (100) GaAs surfaces exposed to ...
Hall scattering factors for electrons and holes in molecular beam epitaxial GaAs layers have been de...
The surface potential of GaAs is strongly modified in the presence of a high‐energy electron beam du...
Previous attempts to passivate the n‐type (100)GaAs surface have significantly reduced only the surf...
Molecular beam epitaxial GaAs layers of electron concentration 1.69×1017 cm−3, and various thickness...
A new model is presented for the description of the surface reconstruction of III-V semiconductors. ...
Molecular beam epitaxial GaAs layers of electron concentration 1.69×1017 cm−3, and various thickness...
A new model is presented for the description of the surface reconstruction of III-V semiconductors. ...
X‐ray photoelectron spectroscopic results show that molecular beam epitaxial GaAs grown at 200 °C ha...
We propose a method for the quantitative evaluation of electron-beam-induced current profiles measur...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Photoreflectance has been used to study the electronic properties of (100) GaAs surfaces exposed to ...
Hall scattering factors for electrons and holes in molecular beam epitaxial GaAs layers have been de...