Phosphorus-doped p-type ZnO thin films were grown on sapphire by radio-frequency magnetron sputtering. The photoluminescence (PL) spectra revealed an acceptor bound exciton peak at 3.355 eV and a conduction band to the acceptor transition caused by a phosphorus related level at 3.310 eV. A study of the dependence of the excitation laser power density and temperature on the characteristics of the PL spectra suggests that the emission lines at 3.310 and 3.241 eV can be attributed to a conduction band to the phosphorus-related acceptor transition and a donor to the acceptor pair transition, respectively. The acceptor energy level of the phosphorus dopant was estimated to be located 127 meV above the valence band
Temperature-dependent photoluminescence properties of undoped, N-doped and N-In codoped p-type ZnO t...
The photoluminescence of ZnO films implanted with phosphorus ions using plasma immersion ion implant...
ZnO/Si films were prepared by radio frequency (RF) magnetron sputtering at room temperature. By opti...
Phosphorus-doped p-type ZnO thin films were grown on sapphire by radio-frequency magnetron sputterin...
P doped ZnO films were grown on quartz by radio frequency-magnetron sputtering method using a ZnO ta...
Zinc oxide (ZnO) thin films were deposited using RF sputtering followed by plasma immersion ion impl...
A solid-source GaP effusion cell was used to provide phosphorus dopants to achieve p-type ZnO with m...
The main objective of this dissertation was to explore the structural, electrical, and optical prope...
Extrinsically doped ZnO thin films are of interest due to their high electrical conductivity and tra...
As-doped ZnO films were grown by the radio frequency magnetron sputtering method. As the substrate t...
As-doped ZnO films were grown by the radio frequency magnetron sputtering method. As the substrate t...
This article is based on material presented at the 6th International Workshop on Zinc Oxide and Rela...
The modulating nature of doping in oxide-based semiconductors has always been an area of interest as...
A ZnO diode was fabricated by using a laser-doping technique to form a p-type ZnO layer on an n-type...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Temperature-dependent photoluminescence properties of undoped, N-doped and N-In codoped p-type ZnO t...
The photoluminescence of ZnO films implanted with phosphorus ions using plasma immersion ion implant...
ZnO/Si films were prepared by radio frequency (RF) magnetron sputtering at room temperature. By opti...
Phosphorus-doped p-type ZnO thin films were grown on sapphire by radio-frequency magnetron sputterin...
P doped ZnO films were grown on quartz by radio frequency-magnetron sputtering method using a ZnO ta...
Zinc oxide (ZnO) thin films were deposited using RF sputtering followed by plasma immersion ion impl...
A solid-source GaP effusion cell was used to provide phosphorus dopants to achieve p-type ZnO with m...
The main objective of this dissertation was to explore the structural, electrical, and optical prope...
Extrinsically doped ZnO thin films are of interest due to their high electrical conductivity and tra...
As-doped ZnO films were grown by the radio frequency magnetron sputtering method. As the substrate t...
As-doped ZnO films were grown by the radio frequency magnetron sputtering method. As the substrate t...
This article is based on material presented at the 6th International Workshop on Zinc Oxide and Rela...
The modulating nature of doping in oxide-based semiconductors has always been an area of interest as...
A ZnO diode was fabricated by using a laser-doping technique to form a p-type ZnO layer on an n-type...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Temperature-dependent photoluminescence properties of undoped, N-doped and N-In codoped p-type ZnO t...
The photoluminescence of ZnO films implanted with phosphorus ions using plasma immersion ion implant...
ZnO/Si films were prepared by radio frequency (RF) magnetron sputtering at room temperature. By opti...