X‐ray photoelectron spectroscopic results show that molecular beam epitaxial GaAs grown at 200 °C has a reduced effective surface potential energy, about 0.5 eV, compared with the usual 0.7 eV. A Poisson analysis of the data, using parameters from Hall effect and absorption measurements, requires that the Fermi‐level‐controlling defect in this material must have a significantly lower activation energy than that of EL2, an unexpected result
By separating a 2‐μm‐thick molecular‐beam‐epitaxial GaAs layer grown at 200 °C from its 650‐μm‐thick...
In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by ...
Infrared optical absorption and Hall-effect techniques were employed to study deep defects in As-ric...
X‐ray photoelectron spectroscopic results show that molecular beam epitaxial GaAs grown at 200 °C ha...
Previous attempts to passivate the n‐type (100)GaAs surface have significantly reduced only the surf...
A thin, undoped, molecular beam epitaxial (MBE) GaAs cap layer grown on top of an n‐type conductive ...
Absorption measurements at 1.1 and 1.2 μm were used along with the known electron and hole photoioni...
The first Hall‐effect measurements on molecular beam epitaxial GaAs layers grown at the low temperat...
Molecular‐beam‐epitaxial GaAs grown at 200 °C has an extremely high (≳1019 cm−3) concentration of As...
Molecular beam epitaxial GaAs layers of electron concentration 1.69×1017 cm−3, and various thickness...
The effect of varying the temperature (T cr) of an As4→As2 cracker furnace between 600 and 700 °C on...
The Ohmic nature of the nonalloyed metal contact on molecular beam epitaxial GaAs grown at 200 °C wa...
The surface potential of GaAs is strongly modified in the presence of a high‐energy electron beam du...
We use the Hall effect and a new charge-transfer technique to study molecular beam epitaxial GaAs gr...
We have observed IR photoquenching of the hopping conduction in GaAs samples grown by molecular beam...
By separating a 2‐μm‐thick molecular‐beam‐epitaxial GaAs layer grown at 200 °C from its 650‐μm‐thick...
In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by ...
Infrared optical absorption and Hall-effect techniques were employed to study deep defects in As-ric...
X‐ray photoelectron spectroscopic results show that molecular beam epitaxial GaAs grown at 200 °C ha...
Previous attempts to passivate the n‐type (100)GaAs surface have significantly reduced only the surf...
A thin, undoped, molecular beam epitaxial (MBE) GaAs cap layer grown on top of an n‐type conductive ...
Absorption measurements at 1.1 and 1.2 μm were used along with the known electron and hole photoioni...
The first Hall‐effect measurements on molecular beam epitaxial GaAs layers grown at the low temperat...
Molecular‐beam‐epitaxial GaAs grown at 200 °C has an extremely high (≳1019 cm−3) concentration of As...
Molecular beam epitaxial GaAs layers of electron concentration 1.69×1017 cm−3, and various thickness...
The effect of varying the temperature (T cr) of an As4→As2 cracker furnace between 600 and 700 °C on...
The Ohmic nature of the nonalloyed metal contact on molecular beam epitaxial GaAs grown at 200 °C wa...
The surface potential of GaAs is strongly modified in the presence of a high‐energy electron beam du...
We use the Hall effect and a new charge-transfer technique to study molecular beam epitaxial GaAs gr...
We have observed IR photoquenching of the hopping conduction in GaAs samples grown by molecular beam...
By separating a 2‐μm‐thick molecular‐beam‐epitaxial GaAs layer grown at 200 °C from its 650‐μm‐thick...
In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by ...
Infrared optical absorption and Hall-effect techniques were employed to study deep defects in As-ric...