In a chemical vapor deposition (CVD) process, a thin film of some material is deposited onto a surface via the chemical reactions of gaseous molecules that contain the atoms needed for the film material. These chemical reactions take place on the surface and in many cases also in the gas phase. To fully understand the chemistry in the process and thereby also have the best starting point for optimizing the process, theoretical chemical modeling is an invaluable tool for providing atomic-scale detail on surface and gas phase chemistry. This overview briefly introduces to the non-expert the main concepts, history and application of CVD, including the pulsed CVD variant known as atomic layer deposition, and put into perspective the use of theo...
Atakan B, Kohse-Höinghaus K. On the importance of gas phase chemistry in two CVD systems: Deposition...
Structure and morphology of materials obtained from CVD varies. It can be a submicron film or a mult...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.Includes...
In a chemical vapor deposition (CVD) process, a thin film of some material is deposited onto a surfa...
International audienceThis paper deals with Chemical Vapor Deposition (CVD) and ALD (Atomic Layer De...
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in dev...
Chemical vapor deposition (CVD) is a process for producing solid particles from volatile precursors ...
A modeling technique based on bond graph methods was proposed for the analysis and understanding of ...
Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential self-termin...
Because of the coupling of the temperature dependence of gas-phase reaction rate constants with the ...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2005.Includes...
Conspectus The deposition of thin solid films is central to many industrial applications, and chemic...
First-principles modeling can be a powerful tool for the understanding and optimization of bottom-up...
First-principles modeling can be a powerful tool for the understanding and optimization of bottom-up...
The formalism for the accurate modeling of chemical vapor deposition (CVD) processes has matured bas...
Atakan B, Kohse-Höinghaus K. On the importance of gas phase chemistry in two CVD systems: Deposition...
Structure and morphology of materials obtained from CVD varies. It can be a submicron film or a mult...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.Includes...
In a chemical vapor deposition (CVD) process, a thin film of some material is deposited onto a surfa...
International audienceThis paper deals with Chemical Vapor Deposition (CVD) and ALD (Atomic Layer De...
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in dev...
Chemical vapor deposition (CVD) is a process for producing solid particles from volatile precursors ...
A modeling technique based on bond graph methods was proposed for the analysis and understanding of ...
Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential self-termin...
Because of the coupling of the temperature dependence of gas-phase reaction rate constants with the ...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2005.Includes...
Conspectus The deposition of thin solid films is central to many industrial applications, and chemic...
First-principles modeling can be a powerful tool for the understanding and optimization of bottom-up...
First-principles modeling can be a powerful tool for the understanding and optimization of bottom-up...
The formalism for the accurate modeling of chemical vapor deposition (CVD) processes has matured bas...
Atakan B, Kohse-Höinghaus K. On the importance of gas phase chemistry in two CVD systems: Deposition...
Structure and morphology of materials obtained from CVD varies. It can be a submicron film or a mult...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.Includes...