Effect of CH/C 2 Species Density on Surface Morphology of Diamond Film Grown by Microwave Plasma Jet Chemical Vapor Deposition

The present research employs in-situ plasma Optical Emission Spectroscopy (OES) to explore the effect of microwave plasma jet chemical vapor deposition (MPJCVD) on activating CH 4 þ H 2 plasma environment and synthesizing diamond film. Surface morphology and main orientation of lattice plane of the diamond synthesized under different processing parameters are also examined. Since species such as CH, H 2 , hydrogen Balmer alpha (H ), carbon dimer (C 2 ) and hydrogen Balmer beta H in the plasma radical are easily influenced by gas concentration, substrate temperature and processing parameters, in-situ OES is employed to diagnose in-situ OES diagnosing is employed to composition of plasma species in the synthesis of diamond film. Our findings reveal that species such as CH, C 2 and H in microwave plasma jet have significant influence on grain size, surface morphology and H/C carbon concentration. The Raman spectrum measurement can prove the relationship between CH/C 2 species density and diamond surface morphology