ABSTRACT Chip design in the nanometer regime is becoming increasingly difficult due to process variations. ASIC designers have adopted statistical optimization techniques to mitigate the effects of variations. The FPGA community on the other hand, has only recently started focussing on the effects of variations. This paper presents a comparative study of the impact of variations on designs mapped to FPGAs and ASICs to get a measure of the severity of the problem in both the FPGA and ASIC domains. We also propose a variation aware router that reduces the yield loss by 7.61X, or the circuit delay by 3.95% for the same yield for the MCNC benchmarks
Continued technology scaling has enabled the tremendous growth that semi-conductor industry has witn...
Parameter variations, which are increasing along with advances in process technologies, affect both...
Technology scaling has increased the transistor\u27s susceptibility to process variations in nanomet...
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. AS...
This thesis proposes optimisation methods for improving the timing performance of digital circuits ...
iii As feature sizes scale toward atomic limits, parameter variation continues to increase, leading ...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
The mitigation of process variability becomes paramount as chip fabrication advances deeper into the...
Abstract — Meeting the tight performance specifications mandated by the customer is critical for con...
Continued miniaturization of semiconductor technology to nanoscale dimensions has elevated reliabili...
As feature sizes scale toward atomic limits, parameter variation continues to increase, leading to i...
Abstract—As semiconductor manufacturing continues towards reduced feature sizes, yield loss due to p...
A reconfiguralbe device can be utilized to enhance speed and yield on the sub-100nm device technolog...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
Increasing variability in today's manufacturing processes causes parametric yield loss that increase...
Continued technology scaling has enabled the tremendous growth that semi-conductor industry has witn...
Parameter variations, which are increasing along with advances in process technologies, affect both...
Technology scaling has increased the transistor\u27s susceptibility to process variations in nanomet...
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. AS...
This thesis proposes optimisation methods for improving the timing performance of digital circuits ...
iii As feature sizes scale toward atomic limits, parameter variation continues to increase, leading ...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
The mitigation of process variability becomes paramount as chip fabrication advances deeper into the...
Abstract — Meeting the tight performance specifications mandated by the customer is critical for con...
Continued miniaturization of semiconductor technology to nanoscale dimensions has elevated reliabili...
As feature sizes scale toward atomic limits, parameter variation continues to increase, leading to i...
Abstract—As semiconductor manufacturing continues towards reduced feature sizes, yield loss due to p...
A reconfiguralbe device can be utilized to enhance speed and yield on the sub-100nm device technolog...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
Increasing variability in today's manufacturing processes causes parametric yield loss that increase...
Continued technology scaling has enabled the tremendous growth that semi-conductor industry has witn...
Parameter variations, which are increasing along with advances in process technologies, affect both...
Technology scaling has increased the transistor\u27s susceptibility to process variations in nanomet...