Coatings and filters for spaceflight far-infrared components require a robust, non-absorptive low-index thin film material to contrast with the typically higher refractive index infrared materials. Barium fluoride is one such material for the 10 to 20µm wavelength infrared region, however its optical and mechanical properties vary depending on the process used to deposit it in thin film form. Thin films of dielectric produced by thermal evaporation are well documented as having a lower packing density and refractive index than bulk material. The porous and columnar micro structure of these films causes possible deterioration of their performance in varied environmental conditions, primarily because of the moisture absorption. Dielectric thi...
To grow dense and hard MgF2 films substrate temperatures of about 300 degrees C are required, which ...
The effective work of optical systems, applied in advanced optic and optoelectronic devices, require...
Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 ...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
The general goal was to build a data base containing optical properties, such as reflectance, transm...
Thin films deposited by standard electron beam evaporation have a columnar microstructure and conseq...
The introduction of non-toxic fluride compounds as direct replacements for Thorium Fluoride (ThF4) h...
Both the transmittance and reflectance of 2 mm thick MgF2 substrates and of thin films of BaF2, CaF2...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
The deposition of barium fluoride thin and ultra-thin films on gallium arsenide substrates was perfo...
561-565Mixed composition optical thin films of zinc telluride-magnesium fluoride, which have not b...
Hafnium oxide (HfO2 or hafnia) holds promise as a high-index dielectric in optical devices and therm...
ArF lithography technology requires minimization of optical losses due to scattering and absorption....
This study characterizes thin films of eleven lanthanide trifluorides which are potentially useful f...
PhDElectrical engineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://...
To grow dense and hard MgF2 films substrate temperatures of about 300 degrees C are required, which ...
The effective work of optical systems, applied in advanced optic and optoelectronic devices, require...
Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 ...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
The general goal was to build a data base containing optical properties, such as reflectance, transm...
Thin films deposited by standard electron beam evaporation have a columnar microstructure and conseq...
The introduction of non-toxic fluride compounds as direct replacements for Thorium Fluoride (ThF4) h...
Both the transmittance and reflectance of 2 mm thick MgF2 substrates and of thin films of BaF2, CaF2...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
The deposition of barium fluoride thin and ultra-thin films on gallium arsenide substrates was perfo...
561-565Mixed composition optical thin films of zinc telluride-magnesium fluoride, which have not b...
Hafnium oxide (HfO2 or hafnia) holds promise as a high-index dielectric in optical devices and therm...
ArF lithography technology requires minimization of optical losses due to scattering and absorption....
This study characterizes thin films of eleven lanthanide trifluorides which are potentially useful f...
PhDElectrical engineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://...
To grow dense and hard MgF2 films substrate temperatures of about 300 degrees C are required, which ...
The effective work of optical systems, applied in advanced optic and optoelectronic devices, require...
Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 ...