Undoped semi-insulating GaAs were implanted with 500 MeV Ne ions. Monte Undoped semi-insulating GaAs were implanted with 500 MeV Ne ions. Mont
Deep level transient spectroscopy was employed to determine the electrical properties of defects ind...
International audienceDamage formation is investigated in GaAs implanted with 1 MeV Si ions to ion f...
The production of strain in (100) GaAs by low-dose ion implantation has been investigated. Implantat...
Changes in electrical properties and crystal structure due to MeV, heavy-ion implants in GaAs have b...
Ion implantation is an alternative technique to the epitaxial growth of semiconductor material for d...
Ion implantation at keV energies has become a well-established technique for surface modification of...
The purpose of this work was to study certain aspects of device fabrication and material properties ...
Pfeiffer W, Liszkay L, Burchard A, et al. Study of indium implanted GaAs: positron annihilation and ...
Electronic properties of Si and Mg implants in undoped semi-insulating GaAs are studied. The activat...
This thesis reports on the investigation of damage production in GaAs at low temperature using the c...
It is shown that the damage measured following 40 keV P+ implantation into GaAs at room temperature,...
Cd in GaAs is an acceptor atom and has the largest atomic diameter among the four commonly-used grou...
Deep-level transient spectroscopy was used to investigate the electrically active defects introduced...
According to established ideas, the irradiation by energetic ions induces a significant number of po...
The surface of semi-isolating GaAs (100) was irradiated with a fluence of 6 × 1017 cm−2 of the N+2 i...
Deep level transient spectroscopy was employed to determine the electrical properties of defects ind...
International audienceDamage formation is investigated in GaAs implanted with 1 MeV Si ions to ion f...
The production of strain in (100) GaAs by low-dose ion implantation has been investigated. Implantat...
Changes in electrical properties and crystal structure due to MeV, heavy-ion implants in GaAs have b...
Ion implantation is an alternative technique to the epitaxial growth of semiconductor material for d...
Ion implantation at keV energies has become a well-established technique for surface modification of...
The purpose of this work was to study certain aspects of device fabrication and material properties ...
Pfeiffer W, Liszkay L, Burchard A, et al. Study of indium implanted GaAs: positron annihilation and ...
Electronic properties of Si and Mg implants in undoped semi-insulating GaAs are studied. The activat...
This thesis reports on the investigation of damage production in GaAs at low temperature using the c...
It is shown that the damage measured following 40 keV P+ implantation into GaAs at room temperature,...
Cd in GaAs is an acceptor atom and has the largest atomic diameter among the four commonly-used grou...
Deep-level transient spectroscopy was used to investigate the electrically active defects introduced...
According to established ideas, the irradiation by energetic ions induces a significant number of po...
The surface of semi-isolating GaAs (100) was irradiated with a fluence of 6 × 1017 cm−2 of the N+2 i...
Deep level transient spectroscopy was employed to determine the electrical properties of defects ind...
International audienceDamage formation is investigated in GaAs implanted with 1 MeV Si ions to ion f...
The production of strain in (100) GaAs by low-dose ion implantation has been investigated. Implantat...