Defect distributions in CdSe thin films, 'as deposited', following thermal annealing, and after 10 years' storage under room conditions are investigated. Steady-state photoconductivity measurements at low temperatures suggest a decrease in the density of 'slow' recombination centres following annealing or storage. Transient photocurrent and thermally stimulated current spectroscopics reveal a peak in the density of states at 0.65 eV below the conduction band edge in the as-deposited film. This broadens and shifts towards the conduction band edge on annealing. Stored films exhibit an almost flat defect distribution, which may result from a combination of both types of defect. Raman scattering measurements suggest that both storage and anneal...
CdSe is one of the significant members of II-VI type semiconducting family and it has a wide range o...
Se profiles in CST (CdSe X Te 1-x ) films formed by annealing CdTe/CdSe bilayers has been studied us...
Electrical instability of operation of the thin film transistor is the major problem preventing the ...
Defect distributions in CdSe thin films, ‘as deposited’, following thermal annealing, and after 10 y...
Defect states and recombination processes are investigated in SiOx/nanocrystalline CdSe multilayer a...
CdSe thin films were grown by thermal evaporation technique under a vacuum of 10-6 torr on glass sub...
Chemically deposited CdSe thin films have been studied attending to their crystalline quality with t...
The influence of annealing in nitrogen atmosphere on the structure, optical and electrical propertie...
Thin films of CdSe with thicknesses of 50, 75 and 100 nm were prepared by physical vapour deposition...
Thin films of AIIBVI compounds are potential candidates for the manufacturing of electronic and opto...
In this study, semiconducting thin films of undoped and In doped CdSe have been deposited by convent...
In this study, semiconducting thin films of undoped and In doped CdSe have been deposited by convent...
Structural and electrical properties of polycrystalline CdSe thin films irradiated with high-energy ...
CdSe: 1% Ag thin films prepared by thermal evaporation method on glass substrates under vacuum techn...
In this work post-growth annealing effect on CdSe/SiO2 thin films grown by rf-magnetron co-sputterin...
CdSe is one of the significant members of II-VI type semiconducting family and it has a wide range o...
Se profiles in CST (CdSe X Te 1-x ) films formed by annealing CdTe/CdSe bilayers has been studied us...
Electrical instability of operation of the thin film transistor is the major problem preventing the ...
Defect distributions in CdSe thin films, ‘as deposited’, following thermal annealing, and after 10 y...
Defect states and recombination processes are investigated in SiOx/nanocrystalline CdSe multilayer a...
CdSe thin films were grown by thermal evaporation technique under a vacuum of 10-6 torr on glass sub...
Chemically deposited CdSe thin films have been studied attending to their crystalline quality with t...
The influence of annealing in nitrogen atmosphere on the structure, optical and electrical propertie...
Thin films of CdSe with thicknesses of 50, 75 and 100 nm were prepared by physical vapour deposition...
Thin films of AIIBVI compounds are potential candidates for the manufacturing of electronic and opto...
In this study, semiconducting thin films of undoped and In doped CdSe have been deposited by convent...
In this study, semiconducting thin films of undoped and In doped CdSe have been deposited by convent...
Structural and electrical properties of polycrystalline CdSe thin films irradiated with high-energy ...
CdSe: 1% Ag thin films prepared by thermal evaporation method on glass substrates under vacuum techn...
In this work post-growth annealing effect on CdSe/SiO2 thin films grown by rf-magnetron co-sputterin...
CdSe is one of the significant members of II-VI type semiconducting family and it has a wide range o...
Se profiles in CST (CdSe X Te 1-x ) films formed by annealing CdTe/CdSe bilayers has been studied us...
Electrical instability of operation of the thin film transistor is the major problem preventing the ...