The influence of the mesa size on the structural and luminescence properties of Ge island layers deposited by low-pressure chemical vapour deposition was studied. Diode structures containing one Ge island layer were grown selectively on patterned wafers with variable area. The analysis shows that the electroluminescence spectra could be separated into three contributions lying at low-, medium and high-energy positions, respectively. The absolute peak intensity of each signal depends on the mesa size and on the injected current density. The signal at the low-energy position was assigned to an effect due to the facets of the diodes; the two other signals originate from islands on the (001) plane having different Si contents or strain states o...
Ordered arrays of Ge islands on a Si( 100) surface were obtained using interference lithography for ...
In this work a study on the surface morphology of nominally pure Ge-islands grown on Si-(001)-substr...
Voids in ultrathin oxide and electron-beam lithography-patterned windows were used to deposit Ge sel...
The distribution of Ge islands is analysed in order to understand their optical behaviour. The Ce is...
In this article we study the electroluminescence of p-i-n diode structures with Ge dots consisting o...
There is an increasing interest in Si-based optoelectronics using Si1-xGex nanostructures due to the...
Arrays of Si0.80Ge0.20/Si(001) square mesas were epitaxially grown by low pressure chemical vapor de...
The structural and optical properties of self-assembled Ge dots grown on Si(110) substrates by low p...
Hut- and dome-shaped islands have been observed during low-pressure vapour phase epitaxy (LPVPE) of ...
The lateral ordering of Ge islands on Si mesa edges is driven by the presence of tensile strain at t...
In this work the morphological, optical and electronic properties of nominally puregermanium islands...
The Stranski–Krastanow growth of SiGe islands by deposition of SiGe alloys instead of pure Ge allows...
The use of Si based materials for optoelectronic applications is hampered by the indirect nature of ...
Self-assembled Ge islands were grown on Si(100) substrate by Si2H6-Ge molecular beam epitaxy. After ...
Self-assembled Ge islands were grown on Si (1 0 0) substrate by Si2H6-Ge molecular beam epitaxy. Sub...
Ordered arrays of Ge islands on a Si( 100) surface were obtained using interference lithography for ...
In this work a study on the surface morphology of nominally pure Ge-islands grown on Si-(001)-substr...
Voids in ultrathin oxide and electron-beam lithography-patterned windows were used to deposit Ge sel...
The distribution of Ge islands is analysed in order to understand their optical behaviour. The Ce is...
In this article we study the electroluminescence of p-i-n diode structures with Ge dots consisting o...
There is an increasing interest in Si-based optoelectronics using Si1-xGex nanostructures due to the...
Arrays of Si0.80Ge0.20/Si(001) square mesas were epitaxially grown by low pressure chemical vapor de...
The structural and optical properties of self-assembled Ge dots grown on Si(110) substrates by low p...
Hut- and dome-shaped islands have been observed during low-pressure vapour phase epitaxy (LPVPE) of ...
The lateral ordering of Ge islands on Si mesa edges is driven by the presence of tensile strain at t...
In this work the morphological, optical and electronic properties of nominally puregermanium islands...
The Stranski–Krastanow growth of SiGe islands by deposition of SiGe alloys instead of pure Ge allows...
The use of Si based materials for optoelectronic applications is hampered by the indirect nature of ...
Self-assembled Ge islands were grown on Si(100) substrate by Si2H6-Ge molecular beam epitaxy. After ...
Self-assembled Ge islands were grown on Si (1 0 0) substrate by Si2H6-Ge molecular beam epitaxy. Sub...
Ordered arrays of Ge islands on a Si( 100) surface were obtained using interference lithography for ...
In this work a study on the surface morphology of nominally pure Ge-islands grown on Si-(001)-substr...
Voids in ultrathin oxide and electron-beam lithography-patterned windows were used to deposit Ge sel...