The structure of undoped SiH films and solar cells deposited under different hydrogen concentration and substrate temperatures were studied. The characterization techniques used were XRD, Raman spectroscopy, TEM, optical absorption, and hydrogen effusion. The high concentration films were amorphous in the as-deposited state but crystallized upon annealing at 700degreesC. Middle and low concentration films were nanocrystalline (nc) and remained nc up to 800degreesC annealing. A theoretical explanation is given for the stability of these films. Such films, on glass substrates, had optical absorption spectra close to those of amorphous material. The solar cell samples, showed some nc morphology in all-concentration states. (C) 2002 Elsevier Sc...
The microstructure, hydrogen bonding configurations and hydrogen content of high quality and stable ...
We report on the structure and optical properties of hydrogenated silicon thin films deposited by pl...
A study on the microstructure of intrinsic, microcrystalline silicon (mu c-Si:H) layers deposited wi...
The structure of undoped Si:H films deposited at a high rate of 6-9 Å/s in an RF (13.56 MHz) plasma ...
[[abstract]]This paper describes the microstructure evolution of hydrogenated silicon films containi...
Nanocrystalline silicon layers have been obtained by thermal annealing of films sputtered in various...
Hydrogenated silicon films with diphasic structure have been prepared by using a new regime of plasm...
This work presents a study on the structural properties of hydrogenated amorphous silicon (a-Si:H) p...
This work presents a study on the structural properties of hydrogenated amorphous silicon (a-Si:H) p...
Microcrystalline SiO:H films have been prepared by the usual RF plasma enhanced chemical vapor depos...
The plasma enhanced chemical vapor deposition(PECVD) system was used for fabricating the silicon fil...
A wide bandgap and highly conductive p-type hydrogenated nanocrystalline silicon (nc-Si:H) window la...
[[abstract]]This paper describes the microstructure evolution of hydrogenated silicon films containi...
Hydrogenated silicon (Si:H) films near the threshold of crystallinity were prepared by very high-fre...
Silicon thin films with a variable content of nanocrystalline phase were deposited on single-crystal...
The microstructure, hydrogen bonding configurations and hydrogen content of high quality and stable ...
We report on the structure and optical properties of hydrogenated silicon thin films deposited by pl...
A study on the microstructure of intrinsic, microcrystalline silicon (mu c-Si:H) layers deposited wi...
The structure of undoped Si:H films deposited at a high rate of 6-9 Å/s in an RF (13.56 MHz) plasma ...
[[abstract]]This paper describes the microstructure evolution of hydrogenated silicon films containi...
Nanocrystalline silicon layers have been obtained by thermal annealing of films sputtered in various...
Hydrogenated silicon films with diphasic structure have been prepared by using a new regime of plasm...
This work presents a study on the structural properties of hydrogenated amorphous silicon (a-Si:H) p...
This work presents a study on the structural properties of hydrogenated amorphous silicon (a-Si:H) p...
Microcrystalline SiO:H films have been prepared by the usual RF plasma enhanced chemical vapor depos...
The plasma enhanced chemical vapor deposition(PECVD) system was used for fabricating the silicon fil...
A wide bandgap and highly conductive p-type hydrogenated nanocrystalline silicon (nc-Si:H) window la...
[[abstract]]This paper describes the microstructure evolution of hydrogenated silicon films containi...
Hydrogenated silicon (Si:H) films near the threshold of crystallinity were prepared by very high-fre...
Silicon thin films with a variable content of nanocrystalline phase were deposited on single-crystal...
The microstructure, hydrogen bonding configurations and hydrogen content of high quality and stable ...
We report on the structure and optical properties of hydrogenated silicon thin films deposited by pl...
A study on the microstructure of intrinsic, microcrystalline silicon (mu c-Si:H) layers deposited wi...