Add to ORKG高功率脉冲磁控溅射(HIPIMS)作为一项极具发展前途的物理气相沉积新技术,近年来引起学术界和工业界的广泛关注.HIPIMS技术(也被称为HPPMS)可以提供足够的放电功率来获得极高的电流密度,数值达到几个A·cm-2;同时,可以得到1019m-3量级的高密度等离子体.溅射过程中独特的等离子体特性表明了该技术的突出优势,因此可实现沉积过程的控制和薄膜性能的优化.文中对HIPIMS技术的IV放电特征,电源设计,以及溅射原子离化率进行深入分析.同时,回顾讨论等离子体时间空间演变规律,离化基团输运,薄膜沉积速率等问题的研究进展
The plasma potential at a typical substrate position is studied during the positive pulse of a bipol...
A time-dependent plasma discharge model has been developed for the ionization region in a high-power...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
选择具有不同溅射产额的靶材料(Cu,Cr,Mo,Ti,V和C),研究了其高功率脉冲磁控溅射(HPPMS)放电靶电流波形随靶电压的演化行为.发现所有材料都满足5个阶段顺序放电特征,但是不同溅射产额的材料...
В статье рассматривается влияние состава газовой среды на характеристики разряда магнетрона при высо...
High power impulse magnetron sputtering( HIPIMS) is a promising technology that has drawn attentio...
The objective of this work was to study dc and High Power Impulse Magnetron Sputtering (HiPIMS) plas...
The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based ...
Представлены результаты экспериментов по исследованию режимов работы импульсного трехфазного источни...
182-182С помощью фильтра Вина (E×B зонда) с системой экстракции экспериментально определен состав ио...
The High Power Impulse Magnetron Sputtering (HiPIMS) systems are designed to improve thin film depos...
The magnetic field is a key feature that distinguishes magnetron sputtering from simple diode sputte...
High power impulse magnetron sputtering (HiPIMS) is a plasma-based thin film deposition technique in...
HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot ...
The work presented in this thesis involves experimental and theoretical studies related to plasma pr...
The plasma potential at a typical substrate position is studied during the positive pulse of a bipol...
A time-dependent plasma discharge model has been developed for the ionization region in a high-power...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
选择具有不同溅射产额的靶材料(Cu,Cr,Mo,Ti,V和C),研究了其高功率脉冲磁控溅射(HPPMS)放电靶电流波形随靶电压的演化行为.发现所有材料都满足5个阶段顺序放电特征,但是不同溅射产额的材料...
В статье рассматривается влияние состава газовой среды на характеристики разряда магнетрона при высо...
High power impulse magnetron sputtering( HIPIMS) is a promising technology that has drawn attentio...
The objective of this work was to study dc and High Power Impulse Magnetron Sputtering (HiPIMS) plas...
The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based ...
Представлены результаты экспериментов по исследованию режимов работы импульсного трехфазного источни...
182-182С помощью фильтра Вина (E×B зонда) с системой экстракции экспериментально определен состав ио...
The High Power Impulse Magnetron Sputtering (HiPIMS) systems are designed to improve thin film depos...
The magnetic field is a key feature that distinguishes magnetron sputtering from simple diode sputte...
High power impulse magnetron sputtering (HiPIMS) is a plasma-based thin film deposition technique in...
HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot ...
The work presented in this thesis involves experimental and theoretical studies related to plasma pr...
The plasma potential at a typical substrate position is studied during the positive pulse of a bipol...
A time-dependent plasma discharge model has been developed for the ionization region in a high-power...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...