The creation of dense periodic nanostructures using block copolymer (BCP) thin films is often struggled due to the formation of inherent defects and a short-ranged orientation, which act as obstacles to the successful application of BCP nanopatterning. While directed self-assembly (DSA) has substantially improved the structural order and controllability of pattern orientation, the quality of nanofabrication through the DSA is below the industrial expectations. Here, we suggest a facile method to create a quasi-single-crystalline 2D hexagonal array while conserving the pattern orientation along the controlled direction over a centimeter-scale area. The arrays are formed during the solvent vapor annealing (SVA) driven morphology transition fr...
Block copolymers (BCP) are a unique class of polymers, which can self-assemble into ordered microdom...
While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only...
We present a simple, versatile approach to generate highly ordered nanostructures of block copolymer...
Despite the great applicability of block copolymer (BCP) thin films capable of producing dense perio...
The directed self-assembly of block copolymers (BCPs) is a promising route to generate highly ordere...
Block copolymer (BCP) self-assembly is of great interest as a cost-effective method for large-scale,...
The defects formed during the microphase separation of block copolymers (BCPs) act as obstacles to l...
Directed self-assembly (DSA) of block copolymers (BCP) can multiply the resolution of conventional l...
Using both theory and experiment, we investigate the possibility of creating perfectly ordered block...
The nanometer-scale architectures in thin films of self-assembling block copolymers have inspired a ...
The self-assembly of block copolymers (BCPs) into well-ordered nanoscopic arrays holds promise for n...
Self-assembly of block copolymers (BCPs) provides an attractive nanolithography approach, which look...
Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assem...
While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only...
Strongly segregating block copolymers (BCPs) are attractive as a means of forming 10 nm scale lithog...
Block copolymers (BCP) are a unique class of polymers, which can self-assemble into ordered microdom...
While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only...
We present a simple, versatile approach to generate highly ordered nanostructures of block copolymer...
Despite the great applicability of block copolymer (BCP) thin films capable of producing dense perio...
The directed self-assembly of block copolymers (BCPs) is a promising route to generate highly ordere...
Block copolymer (BCP) self-assembly is of great interest as a cost-effective method for large-scale,...
The defects formed during the microphase separation of block copolymers (BCPs) act as obstacles to l...
Directed self-assembly (DSA) of block copolymers (BCP) can multiply the resolution of conventional l...
Using both theory and experiment, we investigate the possibility of creating perfectly ordered block...
The nanometer-scale architectures in thin films of self-assembling block copolymers have inspired a ...
The self-assembly of block copolymers (BCPs) into well-ordered nanoscopic arrays holds promise for n...
Self-assembly of block copolymers (BCPs) provides an attractive nanolithography approach, which look...
Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assem...
While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only...
Strongly segregating block copolymers (BCPs) are attractive as a means of forming 10 nm scale lithog...
Block copolymers (BCP) are a unique class of polymers, which can self-assemble into ordered microdom...
While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only...
We present a simple, versatile approach to generate highly ordered nanostructures of block copolymer...