[[abstract]]A TiO2 nanoceramic film was prepared as an alternative absorber layer for infrared thermal detectors. The TiO2 film was amorphous, and its grain size increased. with the ion anode voltage and oxygen flow rate. Moire deflectometry was applied for measuring the nonlinear refractive indices of TiO2 films on polycarbonate (PC) substrates. The nonlinear refraction index was measured to be of the order of 10(-8) cm(2) W-1 and the change in refractive index was of the order of 10(-5). The linear refractive index was correlated with the porosity. Denser TiO2 films exhibited higher linear refractive indices, obvious red-shifts and narrower absorption bands in the near-IR region. (C) 2008 Elsevier Ltd and Techna. Group S.r.l. All rights r...
The structure and optical properties of titanium dioxide films have been studied during annealing fr...
[[abstract]]Al-doped TiO2 (TiO2:Al) films were deposited by simultaneous RF magnetron sputtering of ...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...
[[abstract]]A TiO2 nanoceramic film was prepared as an alternative absorber layer for infrared therm...
[[abstract]]TiO2 thin films were deposited on polycarbonate (PC) substrate by ion beam assisted evap...
[[abstract]]TiO2 thin films were deposited on polycarbonate (PC) substrate by ion beam assisted evap...
[[abstract]]TiO2 nanoceramic films were deposited on polycarbonate (PC) substrate by electron beam e...
[[abstract]]TiO2 nanoceramic films were deposited on polycarbonate (PC) substrate by electron beam e...
[[abstract]]TiO2 nanoceramic films were deposited on glasses by rf magnetron sputtering. This method...
[[abstract]]The Ti-doped TiO2 (TiO2:Ti) nanoceramic films were deposited by simultaneous rf magnetro...
[[abstract]]The N-doped TiO2, Al-doped TiO2 and N-Al co-doped TiO2 films had the similar structure t...
[[abstract]]The N-doped TiO2, Al-doped TiO2 and N-Al co-doped TiO2 films had the similar structure t...
Reactively evaporated TiO2 thin films were deposited on the glass substrate by electron beam heatin...
[[abstract]]Al-doped TiO2 (TiO2:Al) films were deposited by simultaneous RF magnetron sputtering of ...
This paper discusses the optical properties of single-layer TiO2 films deposited using an activated ...
The structure and optical properties of titanium dioxide films have been studied during annealing fr...
[[abstract]]Al-doped TiO2 (TiO2:Al) films were deposited by simultaneous RF magnetron sputtering of ...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...
[[abstract]]A TiO2 nanoceramic film was prepared as an alternative absorber layer for infrared therm...
[[abstract]]TiO2 thin films were deposited on polycarbonate (PC) substrate by ion beam assisted evap...
[[abstract]]TiO2 thin films were deposited on polycarbonate (PC) substrate by ion beam assisted evap...
[[abstract]]TiO2 nanoceramic films were deposited on polycarbonate (PC) substrate by electron beam e...
[[abstract]]TiO2 nanoceramic films were deposited on polycarbonate (PC) substrate by electron beam e...
[[abstract]]TiO2 nanoceramic films were deposited on glasses by rf magnetron sputtering. This method...
[[abstract]]The Ti-doped TiO2 (TiO2:Ti) nanoceramic films were deposited by simultaneous rf magnetro...
[[abstract]]The N-doped TiO2, Al-doped TiO2 and N-Al co-doped TiO2 films had the similar structure t...
[[abstract]]The N-doped TiO2, Al-doped TiO2 and N-Al co-doped TiO2 films had the similar structure t...
Reactively evaporated TiO2 thin films were deposited on the glass substrate by electron beam heatin...
[[abstract]]Al-doped TiO2 (TiO2:Al) films were deposited by simultaneous RF magnetron sputtering of ...
This paper discusses the optical properties of single-layer TiO2 films deposited using an activated ...
The structure and optical properties of titanium dioxide films have been studied during annealing fr...
[[abstract]]Al-doped TiO2 (TiO2:Al) films were deposited by simultaneous RF magnetron sputtering of ...
TiO2 ultrathin films of thickness below 20 nm were deposited by reactive RF magnetron sputtering. Th...