Understanding the factors that influence the structural, mechanical and electrical properties of hybrid metal-carbon multilayer materials and devices are explored in this study by examining the effects of the choice of metal, Cu or Ti, and the number of metal-carbon bilayers. With up to four bilayers, corresponding to ten discrete metal-carbon electrical junctions, lower interfacial stresses and lower electrical resistance are always found in Cu multilayer structures, when compared with Ti containing multilayers. The lower electrical resistance is a result of a copper-carbon interaction which facilitates a carbon sp(3) to sp(2) bonding transformation and is accompanied by a metal-induced transformation of the carbon layer from an amorphous ...
In this project, different molecules have been investigated with the purpose of creating anohmic con...
Free to read at publisher's site.\ud \ud We report the controlled formation and characterization of ...
The dramatic scaling of the integrated circuit technology leads to significant challenges for Cu int...
A longstanding concern in the research of amorphous carbon films is their poor electrical conductivi...
The structure and electrical transport properties of C60 thin films and some metal-C60 multilayer th...
This Article explores the idea of using nonmetallic contacts for molecular electronics. Metal-free, ...
Abstract—In this paper, we examine mechanisms of electron transport across the metal–carbon nanotube...
THESIS 10587Conductive carbon thin films are known to be promising candidates for future electrode m...
Carbon-based nanostructures are attracting tremendous interest as components in ultrafast electronic...
Herein, we present an experimental/computational approach for probing the interaction between metal ...
The structure and electronic properties of carbon atom chains Cn in contact with Ag electrodes are i...
The continuous downward scaling in integrated circuit (IC) technologies has led to rapid shrinking o...
Regardless of used metal contact combinations, bulk-limited electrical behaviors were observed in me...
Improving the interface between copper and carbon nanotubes (CNTs) offers a straightforward strategy...
We here segregate the contributions of contact improvement and change in multiwalled carbon nanotube...
In this project, different molecules have been investigated with the purpose of creating anohmic con...
Free to read at publisher's site.\ud \ud We report the controlled formation and characterization of ...
The dramatic scaling of the integrated circuit technology leads to significant challenges for Cu int...
A longstanding concern in the research of amorphous carbon films is their poor electrical conductivi...
The structure and electrical transport properties of C60 thin films and some metal-C60 multilayer th...
This Article explores the idea of using nonmetallic contacts for molecular electronics. Metal-free, ...
Abstract—In this paper, we examine mechanisms of electron transport across the metal–carbon nanotube...
THESIS 10587Conductive carbon thin films are known to be promising candidates for future electrode m...
Carbon-based nanostructures are attracting tremendous interest as components in ultrafast electronic...
Herein, we present an experimental/computational approach for probing the interaction between metal ...
The structure and electronic properties of carbon atom chains Cn in contact with Ag electrodes are i...
The continuous downward scaling in integrated circuit (IC) technologies has led to rapid shrinking o...
Regardless of used metal contact combinations, bulk-limited electrical behaviors were observed in me...
Improving the interface between copper and carbon nanotubes (CNTs) offers a straightforward strategy...
We here segregate the contributions of contact improvement and change in multiwalled carbon nanotube...
In this project, different molecules have been investigated with the purpose of creating anohmic con...
Free to read at publisher's site.\ud \ud We report the controlled formation and characterization of ...
The dramatic scaling of the integrated circuit technology leads to significant challenges for Cu int...