The fabrication of two-terminal MOSOS capacitors incorporating SOI substrates is described. Results of quasi-static C-V measurements are presented for the first time and compared to existing theoretical models. The suitability of the technique to assess rapidly the quality of an SOI MOS fabrication process is finally discussed
Intrinsic gate-capacitance characteristics of long-channel SOI MOSFETs are investigated by measureme...
SOI fabrication process was characterized using electrical and TEM methods. The investigated SOI str...
The split-C(V) technique has served during three decades for independent extraction of the inversion...
The present paper deals with the analytical and numerical study of MOS capacitors on SOI substrates....
A method is presented which allows the separate characterization of the two interfaces in the SOI MO...
Des modélisations analytiques et numériques de la capacité métal-oxyde-semiconducteur sont proposées...
<正> A new technique know as“MOS Constant Current Quasi-static Small-Signsl Technique”by whichq...
session posterInternational audienceWe investigate for the first time the quasi-static capacitance t...
Measurements of intrinsic gate capacitances of SOI MOSFETs are described and shown to provide valuab...
International audienceThis paper presents a detailed investigation of the quasi-static capacitance-v...
Variations in both MOS capacitor structure and fabrication process were characterized using 1MHz C-V...
A non-quasi-static model of partially-depleted SOI MOSFETs is presented. Phenomena, which are partic...
session 1: parameter extractionInternational audienceWe examine in detail the experimental setup for...
The theoretical foundation of unique floating substrate effects, which have been observed experiment...
Les substrats Silicium-sur-Isolant (SOI) représentent la meilleure solution pour obtenir des disposi...
Intrinsic gate-capacitance characteristics of long-channel SOI MOSFETs are investigated by measureme...
SOI fabrication process was characterized using electrical and TEM methods. The investigated SOI str...
The split-C(V) technique has served during three decades for independent extraction of the inversion...
The present paper deals with the analytical and numerical study of MOS capacitors on SOI substrates....
A method is presented which allows the separate characterization of the two interfaces in the SOI MO...
Des modélisations analytiques et numériques de la capacité métal-oxyde-semiconducteur sont proposées...
<正> A new technique know as“MOS Constant Current Quasi-static Small-Signsl Technique”by whichq...
session posterInternational audienceWe investigate for the first time the quasi-static capacitance t...
Measurements of intrinsic gate capacitances of SOI MOSFETs are described and shown to provide valuab...
International audienceThis paper presents a detailed investigation of the quasi-static capacitance-v...
Variations in both MOS capacitor structure and fabrication process were characterized using 1MHz C-V...
A non-quasi-static model of partially-depleted SOI MOSFETs is presented. Phenomena, which are partic...
session 1: parameter extractionInternational audienceWe examine in detail the experimental setup for...
The theoretical foundation of unique floating substrate effects, which have been observed experiment...
Les substrats Silicium-sur-Isolant (SOI) représentent la meilleure solution pour obtenir des disposi...
Intrinsic gate-capacitance characteristics of long-channel SOI MOSFETs are investigated by measureme...
SOI fabrication process was characterized using electrical and TEM methods. The investigated SOI str...
The split-C(V) technique has served during three decades for independent extraction of the inversion...