In this paper, we present fully-depleted Schottky barrier MOSFETs with dopant-segregated NiSi source and drain junctions. Schottky barrier MOSFETs with a channel length of 80 nm show high on-currents of 900 mu A/ mu m for n-type devices with As segregation and 427 mu A/ mu m for p-type devices with B segregation, respectively. A detailed high-frequency characterization proves the high performance of the devices with cut-off frequencies f/sub T/ of 117 GHz for n-type and 63 GHz for p-type Schottky barrier MOSFETs and clearly elucidates the effects of extrinsic and intrinsic device parameters as a function of gate length.Anglai
A radio-frequency performance of 85-nm gate-length p-type Schottky barrier (SB) with PtSi source/dra...
Schottky barrier (SB)-MOSFETs with NiSi and epitaxial NiSi2 S/D contacts with gate lengths as small ...
This paper proposes to study the impact of a moderate variation of the channel doping level on the e...
In this paper, we present fully-depleted Schottky barrier MOSFETs with dopant-segregated NiSi source...
The continuous downscaling of the Si-based microelectronics, which is the fundament of today's infor...
In this paper. we present a detailed study of nickel-silicide source and drain Schottky barrier MOSF...
We present experimental results on silicon-on-insulator Schottky-barrier MOSFETs with fully silicide...
This letter presents a detailed investigation of the impact of dopant segregation (DS) on radio-freq...
We present a detailed direct current and radiofrequency study of fully depleted dopant-segregated Sc...
As continued MOSFETs scaling becomes increasingly challenging, solutions are urgently needed to meet...
The effect of silicidation induced dopant segregation (DS) on the electrical behavior of silicon-on-...
Schottky-barrier source/drain (S/D) MOSFETs (SB-MOS) have recently demonstrated leading edge high fr...
The dc and radio-frequency performance of 85-nm gate-length p-channel PtSi source/drain Schottky-bar...
Temperature dependent experimental results of Schottky-barrier MOSFETs with dopant segregation using...
We present an experimental analysis of Schottky-barrier metal-oxide-semiconductor field effect trans...
A radio-frequency performance of 85-nm gate-length p-type Schottky barrier (SB) with PtSi source/dra...
Schottky barrier (SB)-MOSFETs with NiSi and epitaxial NiSi2 S/D contacts with gate lengths as small ...
This paper proposes to study the impact of a moderate variation of the channel doping level on the e...
In this paper, we present fully-depleted Schottky barrier MOSFETs with dopant-segregated NiSi source...
The continuous downscaling of the Si-based microelectronics, which is the fundament of today's infor...
In this paper. we present a detailed study of nickel-silicide source and drain Schottky barrier MOSF...
We present experimental results on silicon-on-insulator Schottky-barrier MOSFETs with fully silicide...
This letter presents a detailed investigation of the impact of dopant segregation (DS) on radio-freq...
We present a detailed direct current and radiofrequency study of fully depleted dopant-segregated Sc...
As continued MOSFETs scaling becomes increasingly challenging, solutions are urgently needed to meet...
The effect of silicidation induced dopant segregation (DS) on the electrical behavior of silicon-on-...
Schottky-barrier source/drain (S/D) MOSFETs (SB-MOS) have recently demonstrated leading edge high fr...
The dc and radio-frequency performance of 85-nm gate-length p-channel PtSi source/drain Schottky-bar...
Temperature dependent experimental results of Schottky-barrier MOSFETs with dopant segregation using...
We present an experimental analysis of Schottky-barrier metal-oxide-semiconductor field effect trans...
A radio-frequency performance of 85-nm gate-length p-type Schottky barrier (SB) with PtSi source/dra...
Schottky barrier (SB)-MOSFETs with NiSi and epitaxial NiSi2 S/D contacts with gate lengths as small ...
This paper proposes to study the impact of a moderate variation of the channel doping level on the e...