We investigate the performance of thin-film accumulation mode (AM) SOI MOSFETs for ultrashort channel technologies. Our experimental results show that fully-depleted SOI MOSFETs working in front surface accumulation mode present smaller short-channel effects and better analog performance than AM devices working with body conduction. We therefore demonstrate the potential of surface AM SOI MOS transistors with full film depletion and we present some possible device designs, validated by numerical simulations, in order to work in this new operation mode with low power deep submicron technologies.Anglai
This letter provides a viewpoint for the characterization of state-of-the-art thin film silicon-on-i...
Harsh environments for integrated circuits operation considered here are high temperature and radiat...
Measurements of accumulation-mode (AM) MOS SOI transistors in the 150-300-degrees-C temperature rang...
The behavior of single and double gate accumulation mode silicon-on-insulator (SOI) metal oxide semi...
The behavior of single (SG) and double gate (DG) Accumulation Mode (AM) SOI MOSFETs is thoroughly in...
Traditional scaling methodology which utilizes channel doping, shallow junctions, etc. is no longer ...
Although the reduction of parasitic capacitance and the feasibility of diffusion resistors and capac...
A back-accumulation conduction mechanism ignored in previously-published analyses is shown to be the...
Silicon-On-Insulator (SOI) technology, which was originally developed for military applications, is ...
this this paper presents an performance evaluate of partially depleted soi (pdsoi) mosfet and fully ...
In this paper two kinds of novel localized-SOI structure devices, named as Quasi-SOI MOSFET and sour...
In this paper two kinds of novel localized-SOI structure devices, named as Quasi-SOI MOSFET and sour...
In this paper, the novel Quasi-SOI CMOS architecture is fabricated based on bulk Si substrate for th...
As bulk CMOS is approaching its scaling limit, SOI CMOS is gaining more and more attentions and is c...
An analytical model for the subthreshold slope of the accumulation-mode p-channeI SOI MOSFET is deve...
This letter provides a viewpoint for the characterization of state-of-the-art thin film silicon-on-i...
Harsh environments for integrated circuits operation considered here are high temperature and radiat...
Measurements of accumulation-mode (AM) MOS SOI transistors in the 150-300-degrees-C temperature rang...
The behavior of single and double gate accumulation mode silicon-on-insulator (SOI) metal oxide semi...
The behavior of single (SG) and double gate (DG) Accumulation Mode (AM) SOI MOSFETs is thoroughly in...
Traditional scaling methodology which utilizes channel doping, shallow junctions, etc. is no longer ...
Although the reduction of parasitic capacitance and the feasibility of diffusion resistors and capac...
A back-accumulation conduction mechanism ignored in previously-published analyses is shown to be the...
Silicon-On-Insulator (SOI) technology, which was originally developed for military applications, is ...
this this paper presents an performance evaluate of partially depleted soi (pdsoi) mosfet and fully ...
In this paper two kinds of novel localized-SOI structure devices, named as Quasi-SOI MOSFET and sour...
In this paper two kinds of novel localized-SOI structure devices, named as Quasi-SOI MOSFET and sour...
In this paper, the novel Quasi-SOI CMOS architecture is fabricated based on bulk Si substrate for th...
As bulk CMOS is approaching its scaling limit, SOI CMOS is gaining more and more attentions and is c...
An analytical model for the subthreshold slope of the accumulation-mode p-channeI SOI MOSFET is deve...
This letter provides a viewpoint for the characterization of state-of-the-art thin film silicon-on-i...
Harsh environments for integrated circuits operation considered here are high temperature and radiat...
Measurements of accumulation-mode (AM) MOS SOI transistors in the 150-300-degrees-C temperature rang...