Synthesis of patterned freestanding Nickel nanowires by using ion track-etched polyimide

Nowadays, a lot of applications including nanoelectronics, spintronics or miniaturized sensors are using nanowires. Unfortunately, current techniques used for local synthesis of nanowires are still not fully compatible with common microfabrication techniques. In this study, we focus on the synthesis of patterned metallic nanowires by electrodeposition within nanoporous polyimide membranes integrated on 3 inch Si bulk wafers. Known to have a high planarization factor, a good resistance to most non-oxidizing acids and bases and to be CMOS compatible, polyimide is increasingly used in microsystems. Furthermore, like polycarbonate or polyester, nanoporous polyimide can be obtained by ion track-etching process. This polymer shows then a great interest to be used as a mold for nanowires growth. Patterned freestanding Nickel nanowires have been synthesized over a 100 nm thickness gold layer evaporated onto a SiO2/Si substrate, with diameters of 20 and 60 nm, and length between 2 and 2.5 μm, depending on the electrodeposition time. Such fabrication process is promising to achieve more complex microelectromechanical systems incorporating nanostructures