Despite the increasing importance of energy-balance over drift-diffusion modelling in submicron devices, particularly in impact ionization calculations, we have found that the El-Mansy/Ko model can still be applied with appropriate modifications, This is important because it allows for a simple empirical calculation to provide physical insight for de, ice design
\u3cp\u3eIn small bipolar and MOS transistors, the electrons gain much less energy than according to...
Abstract — High temperature effects on the impact ionization of the n-channel fully depleted (FD) SO...
Impact ionization in fully depleted (FD) Silicon On Insulator (SOI) n-Channel MOSFET is investigated...
Silicon-On-Insulator (SOI) CMOS technology is a potential candidate for the future main-stream techn...
An impact ionization model for SOI circuit simulation was discussed. This model was based on the the...
Abstract When applied to partially depleted SOI MOSFETs, the energy transport model predicts anomalo...
An influence of the selected physical phenomena: impact ionization in silicon and time variation of ...
A novel MOSFET device structure known as Quasi-SOI (QSOI MOSFET) permits direct measurements of subs...
We have investigated the radiation effect on MOSFET performances due to the incidence of a few ions ...
A detailed experimental investigation of impact ionization in n-channel metal–oxide–semiconductor fi...
A new `'Quasi-SOI'' MOSFET structure is shown to allow direct measurement of substrate current in a ...
Impact ionization (II) has played an important role in semiconductor devices; yet the understanding ...
A detailed experimental investigation of impact ionization in n-channel metal-oxide-semiconductor fi...
Conventional macroscopic impact ionization models which use the average carrier energy as main param...
This paper describes a unified framework to model the floating-body effects of various SOI MOSFET op...
\u3cp\u3eIn small bipolar and MOS transistors, the electrons gain much less energy than according to...
Abstract — High temperature effects on the impact ionization of the n-channel fully depleted (FD) SO...
Impact ionization in fully depleted (FD) Silicon On Insulator (SOI) n-Channel MOSFET is investigated...
Silicon-On-Insulator (SOI) CMOS technology is a potential candidate for the future main-stream techn...
An impact ionization model for SOI circuit simulation was discussed. This model was based on the the...
Abstract When applied to partially depleted SOI MOSFETs, the energy transport model predicts anomalo...
An influence of the selected physical phenomena: impact ionization in silicon and time variation of ...
A novel MOSFET device structure known as Quasi-SOI (QSOI MOSFET) permits direct measurements of subs...
We have investigated the radiation effect on MOSFET performances due to the incidence of a few ions ...
A detailed experimental investigation of impact ionization in n-channel metal–oxide–semiconductor fi...
A new `'Quasi-SOI'' MOSFET structure is shown to allow direct measurement of substrate current in a ...
Impact ionization (II) has played an important role in semiconductor devices; yet the understanding ...
A detailed experimental investigation of impact ionization in n-channel metal-oxide-semiconductor fi...
Conventional macroscopic impact ionization models which use the average carrier energy as main param...
This paper describes a unified framework to model the floating-body effects of various SOI MOSFET op...
\u3cp\u3eIn small bipolar and MOS transistors, the electrons gain much less energy than according to...
Abstract — High temperature effects on the impact ionization of the n-channel fully depleted (FD) SO...
Impact ionization in fully depleted (FD) Silicon On Insulator (SOI) n-Channel MOSFET is investigated...