Integration of SnO sub(2) thin-film onto micro-hotplate for gas sensor applications

Anisotropic silicon etching techniques are widely used in various microsensors to create thermally isolated structures of micro-hotplate. Ethylene-diamine-pyrocatechol is one of the most commonly used anisotropic etchants. To integrate sensor arrays of various types of SnO sub(2) thin-film sensors on the microstructure, a way to photolithographically pattern the SnO sub(2) thin-film is needed. The results from such experiments are discussed