Thermal stability of cobalt and nickel silicides

Poon, M.C.
Ho, C.H.
Deng, F.
Lau, S.S.
Wong, H.

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Publication date

January 1998

DOI

10.1016/s0026-2714(98)00045-6

ISSN

0026-2714

Journal

issn:0026-2714

Abstract

Thermal stability of cobalt and nickel silicides on crystalline Si (c-Si) and amorphous Si (a-Si) has been investigated. We have found that CoSi<sub>2</sub> is thermally stable on a-Si and c-Si substrates up to 950°C for 30 min. NiSi is stable and shows low resistivity on c-Si at around 700°C for 30 min, but is unstable on a-Si substrate even after annealing at 400°C. © 1998 Elsevier Science Ltd. All rights reserved

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Thermal stability of cobalt and nickel silicides

Abstract

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Thermal stability of cobalt and nickel silicides

Abstract

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