Si phototransistors with a punchthrough base were fabricated with regular planar technology. Optical conversion gains larger than 15 000 were observed. In addition to very high gain, the unique structure of the device also resulted in a fast transient response as well as low output noise. The measured full width at half maximum of the device transient response is 1.6 ns and a -3 dB bandwidth of 300 MHz. The measured output noises at different currents can be well fitted by the relation i(n)((2) over bar)=2qI(C). (C) 2001 American Institute of Physics
Abstract—The ring-shaped phototransistor with a floating bulk enclosed by a ring-shaped photodiode i...
AbstractSeveral high-speed pnp phototransistors built in a standard 180nm CMOS process are presented...
A thin-film phototransistor with a peak wavelength sensitivity of 420 nm was fabricated by integrati...
In this thesis, two kinds of punch-through phototransistors were studied. GaAs-AlGaAs heterojunctio...
In this paper, we propose, analyze and demonstrate a high-purity float-zone (FZ) silicon phototransi...
A float zone silicon phototransistor is fabricated with sensitivity of 38 A/W for light of wavelengt...
A phototransistor is a promising candidate as an optical power monitor in Si photonic circuits since...
[[abstract]]© 2006 Institute of Electrical and Electronics Engineers-For high-speed optoelectronic a...
We report on a novel near infrared SiGe phototransistor fabricated by a standard silicon photonics f...
[[abstract]]In this paper, without altering any step of the commercial 0.35- μm SiGe BiCMOS process,...
NPN bipolar phototransistors have been designed and fabricated on high-resistivity silicon substrate...
We report a field-effect phototransistor with a channel comprising a thin nanocrystalline silicon tr...
The photoreceptors in biological systems give meaningful outputs over about six orders of magnitude ...
There is significant interest in optical sensors whose fabrication process is fully compatible with ...
International audienceThe first edge illuminated SiGe phototransistor based on the available commerc...
Abstract—The ring-shaped phototransistor with a floating bulk enclosed by a ring-shaped photodiode i...
AbstractSeveral high-speed pnp phototransistors built in a standard 180nm CMOS process are presented...
A thin-film phototransistor with a peak wavelength sensitivity of 420 nm was fabricated by integrati...
In this thesis, two kinds of punch-through phototransistors were studied. GaAs-AlGaAs heterojunctio...
In this paper, we propose, analyze and demonstrate a high-purity float-zone (FZ) silicon phototransi...
A float zone silicon phototransistor is fabricated with sensitivity of 38 A/W for light of wavelengt...
A phototransistor is a promising candidate as an optical power monitor in Si photonic circuits since...
[[abstract]]© 2006 Institute of Electrical and Electronics Engineers-For high-speed optoelectronic a...
We report on a novel near infrared SiGe phototransistor fabricated by a standard silicon photonics f...
[[abstract]]In this paper, without altering any step of the commercial 0.35- μm SiGe BiCMOS process,...
NPN bipolar phototransistors have been designed and fabricated on high-resistivity silicon substrate...
We report a field-effect phototransistor with a channel comprising a thin nanocrystalline silicon tr...
The photoreceptors in biological systems give meaningful outputs over about six orders of magnitude ...
There is significant interest in optical sensors whose fabrication process is fully compatible with ...
International audienceThe first edge illuminated SiGe phototransistor based on the available commerc...
Abstract—The ring-shaped phototransistor with a floating bulk enclosed by a ring-shaped photodiode i...
AbstractSeveral high-speed pnp phototransistors built in a standard 180nm CMOS process are presented...
A thin-film phototransistor with a peak wavelength sensitivity of 420 nm was fabricated by integrati...