Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.</p
The escape of spectral line radiation from laser-produced plasma radiation sources with moderate opa...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
Detailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser p...
Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been ...
Properties of extreme ultraviolet (EUV) and particle emissions from laser-produced tin (Sn) plasma w...
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets ...
Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultr...
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets ...
The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) ligh...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
The work presented in this thesis is primarily concerned with the optimisation of extreme ultraviole...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
An experimental study was made of a target consisting of the minimum mass of pure tin (sSn) necessar...
Laser-produced Sn plasmas have been extensively studied as an efficient soft x-ray light source for ...
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the ...
The escape of spectral line radiation from laser-produced plasma radiation sources with moderate opa...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
Detailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser p...
Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been ...
Properties of extreme ultraviolet (EUV) and particle emissions from laser-produced tin (Sn) plasma w...
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets ...
Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultr...
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets ...
The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) ligh...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
The work presented in this thesis is primarily concerned with the optimisation of extreme ultraviole...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
An experimental study was made of a target consisting of the minimum mass of pure tin (sSn) necessar...
Laser-produced Sn plasmas have been extensively studied as an efficient soft x-ray light source for ...
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the ...
The escape of spectral line radiation from laser-produced plasma radiation sources with moderate opa...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
Detailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser p...