Analysis, simulation, and design of electron-beam-deflection systems are reviewed in light of the current state of theoretical understanding. A brief review of the physical principles is followed by a detailed discussion of electrostatic, magnetostatic, mixed-field, traveling-wave, and scan-expansion systems. Each methodology is examined from a triple perspective: calculation of electromagnetic fields, calculation of electron trajectories, and calculation of the ensemble of trajectories forming the beam. Applications discussed include deflectors for television displays, lithography, scanning microscopes, and CRT oscillography. Developments of the last ten years are stressed, thereby supplementing and updating the author\u27s previous review...
The fast and precise deflection of electron-beams is mandatory for common electron beam tools and ne...
This paper summarizes theoretical research on electron optics in the field of electron microscopy th...
A novel focusing/deflection system for high accuracy, high throughput E-beam lithography, denoted as...
The aim of this master's thesis is to explore and study dynamic aberration correction options in ele...
In the author's previous paper, the theory of electron beam optics in a rotationally symmetrica...
Highly corrected electron-beam blanking systems (EBBS) are required for analyzing fast periodic proc...
A theoretical calculation, based on classical electrodynamics, gives for the maximum angular deflect...
A series of numerical calculations of electron beam generation in the threeelectrode electron-optic...
Introduction: In radiotherapy, megaelectron volt (MeV) electrons are employed for treatment of super...
Abstract—The deflection of charged particle beams by electric and/or magnetic fields is invariably b...
The familiar methods for the numerical calculation of fields in electron optical devices are outline...
In the authors' previous paper, variational deflection aberration theory has been developed for...
The design of modern electron microscopes could not be possible without appropriate software tools. ...
Based on the author's previous papers a theory of electron beam optics in complex six-dimension...
Development of dual speed deflection system for electron beam micropattern generator system is discu...
The fast and precise deflection of electron-beams is mandatory for common electron beam tools and ne...
This paper summarizes theoretical research on electron optics in the field of electron microscopy th...
A novel focusing/deflection system for high accuracy, high throughput E-beam lithography, denoted as...
The aim of this master's thesis is to explore and study dynamic aberration correction options in ele...
In the author's previous paper, the theory of electron beam optics in a rotationally symmetrica...
Highly corrected electron-beam blanking systems (EBBS) are required for analyzing fast periodic proc...
A theoretical calculation, based on classical electrodynamics, gives for the maximum angular deflect...
A series of numerical calculations of electron beam generation in the threeelectrode electron-optic...
Introduction: In radiotherapy, megaelectron volt (MeV) electrons are employed for treatment of super...
Abstract—The deflection of charged particle beams by electric and/or magnetic fields is invariably b...
The familiar methods for the numerical calculation of fields in electron optical devices are outline...
In the authors' previous paper, variational deflection aberration theory has been developed for...
The design of modern electron microscopes could not be possible without appropriate software tools. ...
Based on the author's previous papers a theory of electron beam optics in complex six-dimension...
Development of dual speed deflection system for electron beam micropattern generator system is discu...
The fast and precise deflection of electron-beams is mandatory for common electron beam tools and ne...
This paper summarizes theoretical research on electron optics in the field of electron microscopy th...
A novel focusing/deflection system for high accuracy, high throughput E-beam lithography, denoted as...