Uncertainty Analysis of Calibration Standards for On-wafer Measurements over 110 GHz

We present uncertainty analysis of calibration standards on a commercial calibration substrate for on-wafer S-parameter measurements over 110 GHz. At these frequencies, manufacturing tolerance is comparable to the sizes of calibration standards. Thus accurate knowledge about the actual dimensions of calibration standards becomes critical for system calibration and establishment of uncertainty budget. In this work, three different tools namely surfaceprofiler, optical interferometer, and Scanning Electron Microscope (SEM) have been used to measure calibration standards and investigate the effect of manufacturing tolerance on electrical parameters by using numerical software. Finally uncertainty of calibration standards will be given. In this work, we use three different techniques to characterise calibration standards and obtain manufacturing tolerance. And then numerical software is used to simulate how the electrical parameters are affected by the manufacturing imperfections. Finally uncertainty of the calibration is analysed