Resistive switching devices are considered as one of the most promising candidates for the next generation memories and nonvolatile logic applications. In this paper, BiFeO3:Ti/BiFeO3 (BFTO/BFO) bilayer structures with optimized BFTO/BFO thickness ratio which show symmetric, bipolar, and nonvolatile resistive switching with good retention and endurance performance, are presented. The resistive switching mechanism is understood by a model of flexible top and bottom Schottky-like barrier heights in the BFTO/BFO bilayer structures. The resistive switching at both positive and negative bias make it possible to use both polarities of reading bias to simultaneously program and store all 16 Boolean logic functions into a single cell of a BFTO/BFO ...
Recently bipolar resistive switching of transition metal oxides is investigated to be used in next-g...
We report a continuously tunable resistive switching behavior in Pt/BiFeO₃/Nb-doped SrTiO₃ heterostr...
In this paper, an atomic layer deposited memristor based on Al2O3/MoO3 bi-layer structure is reporte...
The downscaling of transistors is assumed to come to an end within the next years, and the semicondu...
The downscaling of transistors is assumed to come to an end within the next years, and the semicondu...
This review provides a comprehensive examination of the state-of-the-art research on resistive switc...
This review provides a comprehensive examination of the state-of-the-art research on resistive switc...
This review provides a comprehensive examination of the state-of-the-art research on resistive switc...
Pulsed laser deposited Au-BFO-Pt/Ti/Sapphire MIM structures offer excellent bipolar resistive switch...
The advent of multiferroic-based materials has opened the plethora for high tunable multifunctional ...
We report unipolar resistive switching suitable for nonvolatile memory applications in polycrystalli...
The size reduction of transistors has been the main reason for a successful development of semicondu...
The size reduction of transistors has been the main reason for a successful development of semicondu...
This work reports the effect of Ti diffusion on the bipolar resistive switching in Au/BiFeO 3/Pt/Ti ...
Herein, Bi4Ti3O12 (BIT) ferroelectric thin films were fabricated into Au/BIT/LaNiO3/Si structures to...
Recently bipolar resistive switching of transition metal oxides is investigated to be used in next-g...
We report a continuously tunable resistive switching behavior in Pt/BiFeO₃/Nb-doped SrTiO₃ heterostr...
In this paper, an atomic layer deposited memristor based on Al2O3/MoO3 bi-layer structure is reporte...
The downscaling of transistors is assumed to come to an end within the next years, and the semicondu...
The downscaling of transistors is assumed to come to an end within the next years, and the semicondu...
This review provides a comprehensive examination of the state-of-the-art research on resistive switc...
This review provides a comprehensive examination of the state-of-the-art research on resistive switc...
This review provides a comprehensive examination of the state-of-the-art research on resistive switc...
Pulsed laser deposited Au-BFO-Pt/Ti/Sapphire MIM structures offer excellent bipolar resistive switch...
The advent of multiferroic-based materials has opened the plethora for high tunable multifunctional ...
We report unipolar resistive switching suitable for nonvolatile memory applications in polycrystalli...
The size reduction of transistors has been the main reason for a successful development of semicondu...
The size reduction of transistors has been the main reason for a successful development of semicondu...
This work reports the effect of Ti diffusion on the bipolar resistive switching in Au/BiFeO 3/Pt/Ti ...
Herein, Bi4Ti3O12 (BIT) ferroelectric thin films were fabricated into Au/BIT/LaNiO3/Si structures to...
Recently bipolar resistive switching of transition metal oxides is investigated to be used in next-g...
We report a continuously tunable resistive switching behavior in Pt/BiFeO₃/Nb-doped SrTiO₃ heterostr...
In this paper, an atomic layer deposited memristor based on Al2O3/MoO3 bi-layer structure is reporte...