The effect of deposition parameters on the mechanical properties of Cr–C–N coatings

[[abstract]]Cr–C–N coatings were deposited on a high-speed tool steel and Si wafer in Ar/N2/C2H2 plasma with various fixed target currents (1–5 A) using a reactive magnetron sputtering process. This study investigates the effect of the target current on the coating structure and the mechanical properties of the Cr–C–N coatings. Experimental results indicate that the target current (TC) clearly affects the coating structure and mechanical properties. X-ray diffraction results show that the Cr–C–N coating structure can be separated into two categories. The Cr–C–N coatings with a TC less than 2 A exhibit an amorphous DLC structure, while the Cr–C–N coatings with a TC greater than 3 A exhibit a crystalline structure. The Cr–C–N coatings with an amorphous DLC structure exhibit a lower friction coefficient, while the Cr–C–N coatings with a crystalline structure exhibit a higher friction coefficient. The Cr–C–N coatings with a lower friction coefficient exhibit a lower wear rate