The operation of a new class of devices employing the principle of tunnel emission is discussed. It is shown that a controlled electron source may be obtained with the use of a metal-insulator-metal diode structure where the second metal layer is very thin. A triode geometry may be secured by the addition of an additional insulator and a metal collector layer. Limitations on the operating frequency, current density, and current transfer ratio of such devices are discussed. Experimental results on diode and triode are discussed. Experimental results on diode and triode structures which employ several materials are presented. Successful triodes and vacuum emitters have been realized with the use of Al_2O_3, insulating films. Experiments...
By incorporation of a thin layer of near intrinsic semiconductor, one can change a metal-semiconduct...
Financial support for this project has led to advances in the science of single-electron phenomena. ...
Metal-insulator-metal structures based on ultrathin high-k dielectric films are underpinning a rapid...
A new thin‐film tunnel triode is discussed which uses a p‐type amorphous film to achieve amplificati...
This is the publisher’s final pdf. The published article is copyrighted by the American Institute of...
Recent studies on tunnel emission devices have demonstrated that destruction normally occurs becaus...
Quantum physics has had a remarkable development since the last century. We study novel metal-insula...
We propose a new field-effect transistor, the vertical metal insulator semiconductor tunnel transist...
Experiments on the electron transport through thin insulating barriers have been performed with dio...
The geometric effect was investigated in a vertically designed metal-insulator-metal (MIM) tunnel di...
Progress is reported in work towards the development of surface wave sources for the infrared and su...
Metal-Insulator-Metal (MIM), Metal-Insulator-Insulator-Metal (MIIM), and Metal-Insulator-Insulator-I...
The conduction mechanisms in metal-insulator-metal (MIM) junctions where the insulator consists of a...
A survey is given on the research activity and results concerning some new devices with thin ...
The fundamental physics underlying current flow through thin insulating films is reviewed, with emph...
By incorporation of a thin layer of near intrinsic semiconductor, one can change a metal-semiconduct...
Financial support for this project has led to advances in the science of single-electron phenomena. ...
Metal-insulator-metal structures based on ultrathin high-k dielectric films are underpinning a rapid...
A new thin‐film tunnel triode is discussed which uses a p‐type amorphous film to achieve amplificati...
This is the publisher’s final pdf. The published article is copyrighted by the American Institute of...
Recent studies on tunnel emission devices have demonstrated that destruction normally occurs becaus...
Quantum physics has had a remarkable development since the last century. We study novel metal-insula...
We propose a new field-effect transistor, the vertical metal insulator semiconductor tunnel transist...
Experiments on the electron transport through thin insulating barriers have been performed with dio...
The geometric effect was investigated in a vertically designed metal-insulator-metal (MIM) tunnel di...
Progress is reported in work towards the development of surface wave sources for the infrared and su...
Metal-Insulator-Metal (MIM), Metal-Insulator-Insulator-Metal (MIIM), and Metal-Insulator-Insulator-I...
The conduction mechanisms in metal-insulator-metal (MIM) junctions where the insulator consists of a...
A survey is given on the research activity and results concerning some new devices with thin ...
The fundamental physics underlying current flow through thin insulating films is reviewed, with emph...
By incorporation of a thin layer of near intrinsic semiconductor, one can change a metal-semiconduct...
Financial support for this project has led to advances in the science of single-electron phenomena. ...
Metal-insulator-metal structures based on ultrathin high-k dielectric films are underpinning a rapid...