MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks
- Whitlow, Harry J.
- Norarat, Rattanaporn
- Roccio, Marta
- Jeanneret, Patrick
- Guibert, Edouard
- Bergamin, Maxime
- Fiorucci, Gianni
- Homsy, Alexandra
- Laux, Edith
- Keppner, Herbert
- Senn, Pascal
DOIAbstract
Parylenes are poly(p-xylylene) polymers that are widely used as moisture barriers and in biomedicine because of their good biocompatibility. We have investigated MeV ion beam lithography using 16O+ ions for writing defined patterns in Parylene-C, which is evaluated as a coating material for the Cochlear Implant (CI) electrode array, a neuroprosthesis to treat some forms of deafness. Parylene-C and -F on silicon and glass substrates as well as 50 μm thick PTFE were irradiated to different fluences (1×1013-1×10161×1013-1×1016 1 MeV 16O+ ions cm−2) through aperture masks under high vacuum and a low pressure (<10−3 mbar) oxygen atmosphere. Biocompatibility of the irradiated and unirradiated surfaces was tested by cell-counting to determine the ...
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