New ultra-high temperature nanoindentation system for operating at up to 1100 °C

In this work a new ultra-high temperature (UHT) nanoindentation system for testing at up to 1100 °C is presented. The system is capable to perform indents fromsmall scale up to large indentation depths due to the combination of a 1 N actuator and a frame stiffness of N1 � 106 N� m even at 1100 °C. Dynamic testing allows a continuous determination of the contact stiffness (CSM) and thus also the depth-dependent hardness and indentation modulus. Low drift rates can be achieved by an independent tip and sample heating. Operating the nanoindenter inside a scanning electron microscope (SEM) equipped with a high temperature backscattered electron (BSE) detector opens the possibility of in-situ observations, as high vacuumminimizes oxidation effects. The HT capability of the systemis demonstrated on three reference materials: fused silica,molybdenumassessing the change in modulus with increasing temperature using constant strain rate tests (CSR). The creep response of single crystalline Ni has been assessed by strain rate jump (SRJ) as well as a step-load and hold creep (SLH) method. The resulting modulus, hardness as well as the strain rate sensitivity from RT up to 1100 °C are in good accordance with literature data, highlighting the applicability of the system