Application of ultrafast optical techniques to the characterization of millimeter-wave integrated circuits and radiating structures.

This dissertation presents new characterization methods for high-frequency circuits and devices utilizing optical techniques. An electro-optic near-field measurement technique has been developed for characterizing microwave and millimeter wave circuits and radiating structures. Three generations of electro-optic field mapping techniques are categorized with respect to their embodiments. Due to its low invasiveness, broad bandwidth, and high-resolution, the electro-optic near-field mapping system makes it possible to obtain all three orthogonal components of the near-fields of various high-frequency structures, which cannot be obtained by any other measurement methods. The electro-optic field mapping method has demonstrated its uniqueness as an independent characterization method for guided and radiating devices by providing accurate fault isolations and performance verifications with 100-GHz bandwidth and 8 mum spatial resolution. Furthermore, the most recent development in electro-optic field mapping techniques, a fiber-based electro-optic field mapping system, provides maximum measurement flexibility. In addition, the high-resolution near-field data obtained with this technique lead to new radiation wave analysis methods such as an accurate near- to far-field transformation associated with various filtering processes and near-field wave front reconstruction. Also, a photoconductive absolute potential measurement method is discussed as an alternative high-frequency measurement technique.Ph.D.Applied SciencesElectrical engineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/124291/2/3001072.pd