Temperature dependencies of a leakage current in normal mode are explained on the basis of a model, in which the solid state tantalum capacitor is considered as a metal-insulatorsemiconductor (MIS) heterostructure. The measurement was performed in temperature range from 105 to 155°C. Ohmic conductivity increases exponentially with increasing temperature with activation energy 0.94 eV. Tunneling voltage parameter and tunneling energy barrier decreases with increasing temperature, reaching values 0.45 to 0.26 eV
Historically, it has been difficult to correlate the leakage current of capacitor structures involvi...
Metal-insulator-semiconductor Schottky diodes were fabricated to investigate the tunnel effect and t...
The temperature dependence of capacitance for heat-treated, anodized tantalum has been used as a me...
Temperature dependencies of a leakage current in normal mode are explained on the basis of a model, ...
Physical model for tantalum capacitor is given based on metal-insulator–semiconductor (MIS) structur...
The task of the thesis was studding of tantalum capacitors with solid electrolytes properties. Ta – ...
Due to the importance of capacitance temperature stability in precise analog circuit applications, c...
The paper will present the modeling of charge transport in Ta2O5 nanolayers together with experiment...
High temperature and high electric field applications in tantalum and niobium capacitors are limited...
The aim of the thesis is to examine the dielectric function Ta2O5 insulating layers in tantalum capa...
Highly reproducible capacitance-low temperature and dissipation factor-low temperature curves were o...
Tantalum technology is currently capable to meet specifications of automotive industry for high temp...
For the depletion and accumulation modes, equivalent circuits of MIS structure based on an organic P...
The Current-Voltage (IV) measurements on Pt/InN Schottky barrier diodes in the temperature range 10-...
A low frequency noise and charge carriers transport mechanism analysis was performed on tantalum cap...
Historically, it has been difficult to correlate the leakage current of capacitor structures involvi...
Metal-insulator-semiconductor Schottky diodes were fabricated to investigate the tunnel effect and t...
The temperature dependence of capacitance for heat-treated, anodized tantalum has been used as a me...
Temperature dependencies of a leakage current in normal mode are explained on the basis of a model, ...
Physical model for tantalum capacitor is given based on metal-insulator–semiconductor (MIS) structur...
The task of the thesis was studding of tantalum capacitors with solid electrolytes properties. Ta – ...
Due to the importance of capacitance temperature stability in precise analog circuit applications, c...
The paper will present the modeling of charge transport in Ta2O5 nanolayers together with experiment...
High temperature and high electric field applications in tantalum and niobium capacitors are limited...
The aim of the thesis is to examine the dielectric function Ta2O5 insulating layers in tantalum capa...
Highly reproducible capacitance-low temperature and dissipation factor-low temperature curves were o...
Tantalum technology is currently capable to meet specifications of automotive industry for high temp...
For the depletion and accumulation modes, equivalent circuits of MIS structure based on an organic P...
The Current-Voltage (IV) measurements on Pt/InN Schottky barrier diodes in the temperature range 10-...
A low frequency noise and charge carriers transport mechanism analysis was performed on tantalum cap...
Historically, it has been difficult to correlate the leakage current of capacitor structures involvi...
Metal-insulator-semiconductor Schottky diodes were fabricated to investigate the tunnel effect and t...
The temperature dependence of capacitance for heat-treated, anodized tantalum has been used as a me...