Orthogonal patterning of PEDOT:PSS for organic electronics using hydrofluoroether solvents

The sub-micrometer patterning of poly(3,4-ehylenedioxythiophenet): poly(styrene sulfonate) (PEDOT:PSS) films and their applications to the fabrication of field-effect transistors were reported. An acid-stable imaging material for PEDOT:PSS and organic electronic materials were used for this study. The copolymer, derived from the highly fluorinated monomer and photolabile monomer, produced a material that showed a solubility switch following UV irradiation. It was observed that the photolabile component, the ester of 2-nitrobenzyl alcohol and methacrylic acid, decomposed under UV exposure to produce a carboxylic acid and nitrosobenzaldehyde. Two monomers were copolymerized using radical initiation, while multiple polymers were synthesized with varying compositions. It was also found that nonchemically amplified photoresist can be used as an ideal candidate for PEDOT:PSS patterning