The properties of a highly sp3 bonded form of amorphous carbon denoted ta-C deposited from a filtered cathodic vacuum arc (FCVA) are described as a function of ion energy and deposition temperature. The sp3 fraction depends strongly on ion energy and reaches 85% at an ion energy of 100 eV. Other properties such as density and band gap vary in a similar fashion, with the optical gap reaching a maximum of 2.3 eV. These films are very smooth with area roughness of order 1 nm. The sp3 fraction falls suddenly to almost zero for deposition above about 200 °C
The application of a sufficiently high negative substrate bias, during the growth of tetrahedral amo...
Despite numerous investigations of amorphous carbon (a-C) films, a comprehensive study of the feasib...
255-260The plasma parameters obtained using Langmuir probe of the vacuum arc generated in the outer ...
The filtered cathodic vacuum arc (FCVA) technique has proved to be a promising method for deposition...
The filtered cathodic vacuum arc (FCVA) technique has proved to be a promising method for deposition...
Tetrahedral amorphous carbon (ta-C) thin films were deposited using both the filtered cathodic vacuu...
Tetrahedrally bonded amorphous carbon (ta-C) and nitrogen doped (ta-C:N) films were obtained at room...
Studied on the electronic properties of tetrahedral amorphous carbon thin films deposited by filtere...
The structural, optical, electrical and physical properties of amorphous carbon deposited from the f...
The plasma parameters obtained using Langmuir probe of the vacuum arc generated in the outer region ...
The carbon film is first deposited onto a conductive substrate via single-bend filtered cathodic vac...
The field emission behaviour of a series of Tetrahedrally Bonded Amorphous Carbon (ta-C) films has b...
The carbon film is first deposited onto a conductive substrate via single-bend filtered cathodic vac...
A highly tetrahedrally bonded form on nonhydrogenated amorphous carbon (a-C) is produced by depositi...
A highly tetrahedrally bonded form on nonhydrogenated amorphous carbon (a-C) is produced by depositi...
The application of a sufficiently high negative substrate bias, during the growth of tetrahedral amo...
Despite numerous investigations of amorphous carbon (a-C) films, a comprehensive study of the feasib...
255-260The plasma parameters obtained using Langmuir probe of the vacuum arc generated in the outer ...
The filtered cathodic vacuum arc (FCVA) technique has proved to be a promising method for deposition...
The filtered cathodic vacuum arc (FCVA) technique has proved to be a promising method for deposition...
Tetrahedral amorphous carbon (ta-C) thin films were deposited using both the filtered cathodic vacuu...
Tetrahedrally bonded amorphous carbon (ta-C) and nitrogen doped (ta-C:N) films were obtained at room...
Studied on the electronic properties of tetrahedral amorphous carbon thin films deposited by filtere...
The structural, optical, electrical and physical properties of amorphous carbon deposited from the f...
The plasma parameters obtained using Langmuir probe of the vacuum arc generated in the outer region ...
The carbon film is first deposited onto a conductive substrate via single-bend filtered cathodic vac...
The field emission behaviour of a series of Tetrahedrally Bonded Amorphous Carbon (ta-C) films has b...
The carbon film is first deposited onto a conductive substrate via single-bend filtered cathodic vac...
A highly tetrahedrally bonded form on nonhydrogenated amorphous carbon (a-C) is produced by depositi...
A highly tetrahedrally bonded form on nonhydrogenated amorphous carbon (a-C) is produced by depositi...
The application of a sufficiently high negative substrate bias, during the growth of tetrahedral amo...
Despite numerous investigations of amorphous carbon (a-C) films, a comprehensive study of the feasib...
255-260The plasma parameters obtained using Langmuir probe of the vacuum arc generated in the outer ...