Magnetron sputtered Al–Si–N thin films with varying silicon content were developed by Al–Si target with different amount of silicon by weight % (0, 5, 10, 14, 20). The effect of increasing silicon content on structural, mechanical and optical behaviour was investigated. The phase analysis and crystallite size of the films were studied by X-Ray Diffraction. The changes in microstructure of the coatings were studied by scanning electron and transmission electron microscopes (SEM, TEM). Mechanical behaviour such as hardness, elastic modulus and creep were studied by nanoindentation. The optical transmittance spectra of Al–Si–N film system at varying silicon content were acquired by UV–Visible Spectrometer. The correlation between the microstru...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
Aluminosilicate (Al–Si–O) thin films containing up to 31 at.% Al and 23 at.% Si were prepared by rea...
Abstract: In this paper, we study the optical properties of aluminum- and silicon-nitride films and ...
Hard and optically transparent nanocomposite Al-Si-N thin films were deposited using DC magnetron sp...
Nanocomposite Al-Si-N coatings have been successfully deposited by d.c. magnetron sputtering on diff...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Si–C–N nanocomposite thin films were deposited on industrially important substrates like silicon (1 ...
The paper presents the results of investigations of the structural and phase conditions, mechanical ...
(Ti,Si,Al)N nanocomposite coatings with different Ti, Si, Al contents, were deposited onto silicon a...
A comparative study on the strain rate sensitivity behaviour of magnetron sputtered Al, Al-Si and Al...
This article reports on the influence of the sputtering parameters (discharge voltage, average targe...
Thin films of homogeneous mixture of amorphous silicon and aluminum were produced with magnetron spu...
Ž.Ti,Al,Si N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents...
International audienceZr–Si–N films were deposited on silicon and X38CrMoV5 steel substrates by sput...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
Aluminosilicate (Al–Si–O) thin films containing up to 31 at.% Al and 23 at.% Si were prepared by rea...
Abstract: In this paper, we study the optical properties of aluminum- and silicon-nitride films and ...
Hard and optically transparent nanocomposite Al-Si-N thin films were deposited using DC magnetron sp...
Nanocomposite Al-Si-N coatings have been successfully deposited by d.c. magnetron sputtering on diff...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Si–C–N nanocomposite thin films were deposited on industrially important substrates like silicon (1 ...
The paper presents the results of investigations of the structural and phase conditions, mechanical ...
(Ti,Si,Al)N nanocomposite coatings with different Ti, Si, Al contents, were deposited onto silicon a...
A comparative study on the strain rate sensitivity behaviour of magnetron sputtered Al, Al-Si and Al...
This article reports on the influence of the sputtering parameters (discharge voltage, average targe...
Thin films of homogeneous mixture of amorphous silicon and aluminum were produced with magnetron spu...
Ž.Ti,Al,Si N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents...
International audienceZr–Si–N films were deposited on silicon and X38CrMoV5 steel substrates by sput...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
Aluminosilicate (Al–Si–O) thin films containing up to 31 at.% Al and 23 at.% Si were prepared by rea...