A study of poly(methyl methacrylate) as an electron beam resist.

Some polymers exhibit property changes when exposed to ionizing radiation. When these changes are great enough that irradiated areas may be distinguished from unirradiated areas, the polymer may be suitable for use as a resist in the fabrication of semi -conducting devices. The exact nature of the lithographic resist will be explained more thoroughly later; however it is an essential step in the building of integrated circuitry