Add to ORKGThe paper presents the results of theoretical basis of possibility of nanostructured thin-film formation by mechanical stress creation in ultra-thin films deposited on a substrate during their thermal annealing. The experiment results of palladium (Pd) ultra-thin films obtained on silicon (Si) substrates and their vacuum annealing are also presented. The samples were studied by AES and SEM methods. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/2490
Metallisation is a vital process for micro- and nanofabrication, allowing the controlled preparation...
This paper examines the factors that influence the quality of nanostructures fabricated by sectionin...
The first volume in "The Handbook of Nanostructured Thin Films and Coatings" set, this book concentr...
The paper presents the results of theoretical basis of possibility of nanostructured thin-film forma...
Thin films are important in many of the technologies used every day, impacting major markets for ene...
AbstractNanosized palladium layers on silicon (100) substrates were obtained employing MOCVD method ...
The paper describes the nanostructured coatings produced by C-PVD method at various deposition condi...
Small devices, in the range of nanometers, are playing a major role in today\u27s technology. The fi...
In lieu of an abstract, this is an excerpt from the first page.The field of thin film technology [1]...
Palladium thin films, with a thickness of about 110 ?, were deposited at room temperature on glass s...
In the present study the methods of synthesis and characterization of metal nanoparticles structure...
We’ve integrated an atomic layer deposition (ALD), a physical vapor deposition (PVD) and a nanoparti...
A number of articles on strengthening thin film coatings were analyzed and a lot of unusual strength...
Nanoporous ultrathin films, constituted by a slab less than 100 nm thick and a certain void volume f...
Selectivity is a critical attribute of catalysts used in manufacturing of essential and fine chemica...
Metallisation is a vital process for micro- and nanofabrication, allowing the controlled preparation...
This paper examines the factors that influence the quality of nanostructures fabricated by sectionin...
The first volume in "The Handbook of Nanostructured Thin Films and Coatings" set, this book concentr...
The paper presents the results of theoretical basis of possibility of nanostructured thin-film forma...
Thin films are important in many of the technologies used every day, impacting major markets for ene...
AbstractNanosized palladium layers on silicon (100) substrates were obtained employing MOCVD method ...
The paper describes the nanostructured coatings produced by C-PVD method at various deposition condi...
Small devices, in the range of nanometers, are playing a major role in today\u27s technology. The fi...
In lieu of an abstract, this is an excerpt from the first page.The field of thin film technology [1]...
Palladium thin films, with a thickness of about 110 ?, were deposited at room temperature on glass s...
In the present study the methods of synthesis and characterization of metal nanoparticles structure...
We’ve integrated an atomic layer deposition (ALD), a physical vapor deposition (PVD) and a nanoparti...
A number of articles on strengthening thin film coatings were analyzed and a lot of unusual strength...
Nanoporous ultrathin films, constituted by a slab less than 100 nm thick and a certain void volume f...
Selectivity is a critical attribute of catalysts used in manufacturing of essential and fine chemica...
Metallisation is a vital process for micro- and nanofabrication, allowing the controlled preparation...
This paper examines the factors that influence the quality of nanostructures fabricated by sectionin...
The first volume in "The Handbook of Nanostructured Thin Films and Coatings" set, this book concentr...