Add to ORKGThe magnetron sputtered coatings on base AlN-TiB2(TiSi2) were investigated in this paper. The ele-ment composition, structural-phase composition, morphology and mechanical properties were investigated before and after annealing of coatings under 1350 °C. The concentration of elements in the coating were changed after annealing under 900 °C and further annealing under 1350 °C (especially after annealing under 1350 °C).The hardness of as-deposited coatings was 15 GPa, but after the annealing under 1350 °C the value of hardness was increased up to (2223.5) GPa. The value of the index viscoplastic was 0,07. The amorphous like structure and high damping properties of the AlN-TiB2(TiSi2) coating makes promising the use of these coatings as a cont...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Various approaches to creating multicomponent na-nocomposite coatings of high and superhigh hardness...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
The magnetron sputtered coatings on base AlN-TiB2(TiSi2) were investigated. The element composition,...
The coatings investigated in this paper were deposited via the magnetron sputtering of AlN-TiB2(TiSi...
The magnetron sputtered coatings on base AlN-TiB2(TiSi2) were investigated in this paper. The ele-me...
The coating of the AlN–TiB2–TiSi2 system has been produced by the magnetron sputtering of a target....
High temperature composite target AlN–TiB2–TiSi2 with heterogeneous distribution of compounds (AlN—5...
he paper describes used a beam of negative ions Au- and performed high-temperature annealing for rec...
TiAlN, TiSiN, and TiCrN composite layers were deposited by magnetron sputtering and sliding angle ...
The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel subst...
The recrystallization of the structure of an X-ray amorphous AlN–TiB2–TiSi2 coating containing short...
This article reports on the thorough characterization of structural-phase transformation in amorphou...
Nanostructured Ti-B-N based coatings are widely employed in many applications for the excellent prop...
In order to improve the functional properties of hard coatings, recent investigations have been dire...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Various approaches to creating multicomponent na-nocomposite coatings of high and superhigh hardness...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
The magnetron sputtered coatings on base AlN-TiB2(TiSi2) were investigated. The element composition,...
The coatings investigated in this paper were deposited via the magnetron sputtering of AlN-TiB2(TiSi...
The magnetron sputtered coatings on base AlN-TiB2(TiSi2) were investigated in this paper. The ele-me...
The coating of the AlN–TiB2–TiSi2 system has been produced by the magnetron sputtering of a target....
High temperature composite target AlN–TiB2–TiSi2 with heterogeneous distribution of compounds (AlN—5...
he paper describes used a beam of negative ions Au- and performed high-temperature annealing for rec...
TiAlN, TiSiN, and TiCrN composite layers were deposited by magnetron sputtering and sliding angle ...
The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel subst...
The recrystallization of the structure of an X-ray amorphous AlN–TiB2–TiSi2 coating containing short...
This article reports on the thorough characterization of structural-phase transformation in amorphou...
Nanostructured Ti-B-N based coatings are widely employed in many applications for the excellent prop...
In order to improve the functional properties of hard coatings, recent investigations have been dire...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Various approaches to creating multicomponent na-nocomposite coatings of high and superhigh hardness...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...