In this research, we report on the measurement of the capacitance-voltage (C-V) characteristics Al / ZnO / p-Si / Al Schottky diode at room temperature and in dark condition fabricated by spray pyrolysis process. C-V characteristics, within the range of frequencies 5 kHz-5 MHz, are investigated and microelectronic parameters are extracted. Donor density and diffusion potential vary with frequency from 15 to 28 1014 cm – 3, 0.21 to 0.45 V. Besides, the interface state density of Al /ZnO /pSi/Al Schottky is determined and found to be 1012 (eV cm²) – 1. Calculated at 1 MHz, the interfacial layer thickness and depletion layer width are of 760 Å and 0.28 m
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
WOS: 000293519600032In this study, the dielectric properties and alternating-current (ac) conductivi...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
The photovoltaic properties of a good rectifying Al/ZnO/pSi/Al Schottky diode are studied. The diode...
WOS: 000480558400057In this study, temperature-dependent current-voltage (I-V), frequency-dependent ...
SummaryAn array of Gold (Au) schottky contacts have been deposited on RF Sputtered nanocrystalline Z...
Al/p-CuInAlSe2 polycrystalline schottky diodes fabricated by flash evaporation method were undertake...
An array of Gold (Au) schottky contacts have been deposited on RF Sputtered nanocrystalline Zinc Oxi...
The effect of indium on the characteristics of Ag / SnO2 : In / Si / Au Schottky diode (SD) is studi...
Much work has been carried out in recent years in fabricating and studying the Schottky contact form...
The main objective of the research was the fabrication and characterization of MOS/MIS capacitors wi...
Schottky diodes with Au/ZnO nanorod (NR)/n-SiC configurations have been fabricated and their interfa...
WOS: 000280941000134The temperature dependence of capacitance-voltage (C-V) and conductance-voltage ...
Enhancement of the properties of zinc oxide (ZnO)-based Schottky diodes has been explored using a co...
Since the importance of Schottkky devices, Au/ZnO/n-Si device were obtained, and the capacitance–vol...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
WOS: 000293519600032In this study, the dielectric properties and alternating-current (ac) conductivi...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
The photovoltaic properties of a good rectifying Al/ZnO/pSi/Al Schottky diode are studied. The diode...
WOS: 000480558400057In this study, temperature-dependent current-voltage (I-V), frequency-dependent ...
SummaryAn array of Gold (Au) schottky contacts have been deposited on RF Sputtered nanocrystalline Z...
Al/p-CuInAlSe2 polycrystalline schottky diodes fabricated by flash evaporation method were undertake...
An array of Gold (Au) schottky contacts have been deposited on RF Sputtered nanocrystalline Zinc Oxi...
The effect of indium on the characteristics of Ag / SnO2 : In / Si / Au Schottky diode (SD) is studi...
Much work has been carried out in recent years in fabricating and studying the Schottky contact form...
The main objective of the research was the fabrication and characterization of MOS/MIS capacitors wi...
Schottky diodes with Au/ZnO nanorod (NR)/n-SiC configurations have been fabricated and their interfa...
WOS: 000280941000134The temperature dependence of capacitance-voltage (C-V) and conductance-voltage ...
Enhancement of the properties of zinc oxide (ZnO)-based Schottky diodes has been explored using a co...
Since the importance of Schottkky devices, Au/ZnO/n-Si device were obtained, and the capacitance–vol...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
WOS: 000293519600032In this study, the dielectric properties and alternating-current (ac) conductivi...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...