It has been found that the phase with the fcc lattice of the NaCl structural type is formed due to the vacuumarc deposition of the nanostructured multicomponent (TiZrHfVNbTa)N coating. Implantation of negative Au– ions with a dose of 1 × 1017 cm–2 leads to the formation of a disordered polycrystalline struc ture without a preferred orientation of the fcc phase and nanocrystallites from 5–7 to 1–3 nm is size, which are dispersed in a layer up to 35 nm in depth. Nanohardness increases to 33 GPa, and the Vickers hardness reaches 51 GPa. Gold nanoclusters are formed in the nearsurface region, while the fcc lattice and the for mation of local Au regions are observed in the coating itself. Fragments with the hcp lattice are formed at depth...
The paper investigates the structure and properties of nanoscale multilayer coatings based on (TiZr)...
Au-core, Au3Cu-alloyed shell nanoparticles passivated with CuS2 were fabricated by the polyol method...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
The formation of a phase with a FCC lattice of the NaCl structure type is observed following the de...
The nitrides of highentropy alloys, (TiZrAlYNb)N, fabricated by cathodic vacuum arc evaporation are ...
New classes of high-entropy alloys, which consist of at least 5 main elements with atomic concentrat...
The recrystallization of the structure of an X-ray amorphous AlN–TiB2–TiSi2 coating containing short...
Nitrides of high-entropy alloys (TiHfZrNbVTa)N were fabricated using cathodic-vacuum-arc-vapor depos...
Multicomponent nanostructured coatings based on (TiZrNbAlYCr)N with a hardness as high as 47 GPa we...
A novel (TiZrNbTaHf)N/MoN nanocomposite coatings, which consist of the nitride of the high-entropy a...
Superhard nanostructured Ti–Hf–N(Fe) coatings are prepared. The formation of local regions of (Ti, ...
Nitride nanostructured coatings, which are based on high entropy alloys implanted with high doses of...
Co–Au core-shell nanocrystals (NCs) were formed by sequential ion implantation of Au and Co into thi...
AbstractThe linear and non-linear optical properties of silica may be tailored by the introduction o...
The growth and structure of Pt nanocrystals (NCs) formed by ion implantation in a-SiO₂ has been inve...
The paper investigates the structure and properties of nanoscale multilayer coatings based on (TiZr)...
Au-core, Au3Cu-alloyed shell nanoparticles passivated with CuS2 were fabricated by the polyol method...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
The formation of a phase with a FCC lattice of the NaCl structure type is observed following the de...
The nitrides of highentropy alloys, (TiZrAlYNb)N, fabricated by cathodic vacuum arc evaporation are ...
New classes of high-entropy alloys, which consist of at least 5 main elements with atomic concentrat...
The recrystallization of the structure of an X-ray amorphous AlN–TiB2–TiSi2 coating containing short...
Nitrides of high-entropy alloys (TiHfZrNbVTa)N were fabricated using cathodic-vacuum-arc-vapor depos...
Multicomponent nanostructured coatings based on (TiZrNbAlYCr)N with a hardness as high as 47 GPa we...
A novel (TiZrNbTaHf)N/MoN nanocomposite coatings, which consist of the nitride of the high-entropy a...
Superhard nanostructured Ti–Hf–N(Fe) coatings are prepared. The formation of local regions of (Ti, ...
Nitride nanostructured coatings, which are based on high entropy alloys implanted with high doses of...
Co–Au core-shell nanocrystals (NCs) were formed by sequential ion implantation of Au and Co into thi...
AbstractThe linear and non-linear optical properties of silica may be tailored by the introduction o...
The growth and structure of Pt nanocrystals (NCs) formed by ion implantation in a-SiO₂ has been inve...
The paper investigates the structure and properties of nanoscale multilayer coatings based on (TiZr)...
Au-core, Au3Cu-alloyed shell nanoparticles passivated with CuS2 were fabricated by the polyol method...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...