Photolithography at GT-IEN: An Overview of Processes and Equipment

Presented on May 14, 2020 from 11:00 a.m.-12:00 p.m. SENIC Technical Webinar Series: Session 4.The Southeastern Nanotechnology Infrastructure Corridor (SENIC) housed at the Institute for Electronics and Nanotechnology at Georgia Tech hosted a series of online technical seminars, open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research.Dr. Hang Chen received his bachelor and master degrees in chemistry from Fudan University in Shanghai, China. He obtained his doctorate, also in chemistry, from Georgia Tech in 2005 and was a post-doc at the Nanotechnology Research Center before joining the IEN as a Research Scientist in 2008. Currently, he is the process support manager at IEN. His research interests include chemically sensitive field-effect transistors, MEMS-CMOS device integration, and organic electronics.Runtime: 54:37 minutesPhotolithography has always been the most important technique in microelectronics fabrication. It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate, or it can be directly written with a UV-laser equipment. It provides precise control of the shape and size of the objects it creates and can create patterns over an entire surface cost-effectively. The Georgia Tech Institute for Electronics and Nanotechnology (IEN) cleanroom provides various types of photolithography equipment to satisfy different processing needs. Each tool has its own unique characteristics and serves different purposes. In this seminar, a brief introduction to the equipment and patterning capabilities of the IEN will be presented. Common processing issues related to photolithography will also be discussed