Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.Based on the Monte Carlo method, a model of growth of thin films prepared by oblique angle deposition of particles is constructed. The morphology of structures synthesized by simulation is analyzed. To study the character of distribution of microstructural elements (columns) in the film plane, the autocorrelation function of the microstructure and the fast Fourier transform are used. It is shown that with increasing angle of particle incidence, the film density monotonically decreases; in this case, anisotropy arises and monotonically increases in the cross sections of columns, and the anisotropy of distribution of columns in the substrate plane also increases
Two spatial dimension front tracking simulations have been performed to study the growth of polycrys...
Starting from the well-known idea of atomic shadowing during thin film growth (i.e. ballistic aggreg...
We describe here the deposition of thin films using magnetron sputtering at oblique angles. General ...
Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.Based on the Monte...
Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.The relation betwe...
L’objectif de ce travail est de déterminer expérimentalement les paramètres d’entrée des logiciels d...
Physical vapor deposition is a fundamental tool to create thin films for countless applications. Dep...
Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.The magnetization ...
Atomistic, molecular dynamics simulations are employed to investigate the relationship between film ...
The microstructural features of amorphous TiO2 thin films grown by the electron beam physical vapour...
The present work represents a systematical study of the growth of columnar, metallic thin films depo...
The present work represents a systematical study of the growth of columnar, metallic thin films depo...
The growth of nanostructured physical vapor deposited thin films at oblique angles is becoming a hot...
The evolution of structure in thin films is usually discussed using a kinetic description. This desc...
The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposit...
Two spatial dimension front tracking simulations have been performed to study the growth of polycrys...
Starting from the well-known idea of atomic shadowing during thin film growth (i.e. ballistic aggreg...
We describe here the deposition of thin films using magnetron sputtering at oblique angles. General ...
Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.Based on the Monte...
Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.The relation betwe...
L’objectif de ce travail est de déterminer expérimentalement les paramètres d’entrée des logiciels d...
Physical vapor deposition is a fundamental tool to create thin films for countless applications. Dep...
Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.The magnetization ...
Atomistic, molecular dynamics simulations are employed to investigate the relationship between film ...
The microstructural features of amorphous TiO2 thin films grown by the electron beam physical vapour...
The present work represents a systematical study of the growth of columnar, metallic thin films depo...
The present work represents a systematical study of the growth of columnar, metallic thin films depo...
The growth of nanostructured physical vapor deposited thin films at oblique angles is becoming a hot...
The evolution of structure in thin films is usually discussed using a kinetic description. This desc...
The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposit...
Two spatial dimension front tracking simulations have been performed to study the growth of polycrys...
Starting from the well-known idea of atomic shadowing during thin film growth (i.e. ballistic aggreg...
We describe here the deposition of thin films using magnetron sputtering at oblique angles. General ...