WOS: 000394232600022We have studied electrical and dielectric parameters of the Al/ZnS-PVA/p-Si structures using admittance measurements. For this aim, capacitance/conductance-voltage (C/G-V) measurements were performed in the frequency range of 10 kHz-5 MHz and voltages (+/- 4 V) by 50 mV steps at 300 K. Experimental results confirmed that both electric and dielectric parameters are strong function of frequency and voltage and they are especially influenced from series resistance (R-s), surface states (N-ss) and polarization processes. The values of R-s and N-ss which are obtained from the Nicollian and Brews and Hill-Coleman method, respectively, and they are decrease with increasing frequency almost as exponentially. In addition, the val...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
Current-voltage-temperature and admittance-gate bias-temperature measurements were performed on Al/p...
In this study, the effect of frequency and voltage on the dielectric properties of Al/(CdS-PVA)/p-Si...
WOS: 000438679000024In this study zinc sulphide (ZnS) nanostructures have been prepared by microwave...
WOS: 000340097400004The dielectric properties, electric modulus and ac electrical conductivity (sigm...
Condensed Matter Physics Conference of Balkan Countries -- MAY 26-28, 2008 -- Univ Mugla, Mugla, TUR...
WOS: 000253030300020The forward and reverse bias capacitance-voltage (C V) and conductance-voltage (...
In the present work , the effect of frequency and bias voltage on electrical and dielectric properti...
WOS: 000310316800020The admittance technique was used in order to investigate the frequency dependen...
WOS: 000253030300001Different from conventional metal-Si compounds-n-Si structures, the thin film of...
The measured capacitance and conductance-voltage (C & G/omega-V) data between 1 and 200 kHz of Al/(B...
The voltage and frequency dependence of dielectric constant є′, dielectric loss є″, electrical modul...
In this study, MOS capacitors of Al/ZrO2/IL/n-Si (IL: interface layer) have been fabricated. Bias sc...
In order to improve and detailedly investigate the dielectric properties of polymer interfaces of Me...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
Current-voltage-temperature and admittance-gate bias-temperature measurements were performed on Al/p...
In this study, the effect of frequency and voltage on the dielectric properties of Al/(CdS-PVA)/p-Si...
WOS: 000438679000024In this study zinc sulphide (ZnS) nanostructures have been prepared by microwave...
WOS: 000340097400004The dielectric properties, electric modulus and ac electrical conductivity (sigm...
Condensed Matter Physics Conference of Balkan Countries -- MAY 26-28, 2008 -- Univ Mugla, Mugla, TUR...
WOS: 000253030300020The forward and reverse bias capacitance-voltage (C V) and conductance-voltage (...
In the present work , the effect of frequency and bias voltage on electrical and dielectric properti...
WOS: 000310316800020The admittance technique was used in order to investigate the frequency dependen...
WOS: 000253030300001Different from conventional metal-Si compounds-n-Si structures, the thin film of...
The measured capacitance and conductance-voltage (C & G/omega-V) data between 1 and 200 kHz of Al/(B...
The voltage and frequency dependence of dielectric constant є′, dielectric loss є″, electrical modul...
In this study, MOS capacitors of Al/ZrO2/IL/n-Si (IL: interface layer) have been fabricated. Bias sc...
In order to improve and detailedly investigate the dielectric properties of polymer interfaces of Me...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
Au/ZnO/n-type Si device is obtained using atomic layer deposition (ALD) for ZnO layer, and some main...
Current-voltage-temperature and admittance-gate bias-temperature measurements were performed on Al/p...