A CCD‐based, computer controlled RHEED detection and analysis system that utilizes an on‐chip integration technique and on‐board data manipulation is described. The system is capable of in situ time‐resolved measurements of specular and integral‐order intensity oscillations, their phase differences, streak linewidths, and epitaxial layer lattice constants. The digital RHEED techniques are described in the context of Co/Au bilayer, GaAs/GaAs, and InxGa1−xAs/GaAs MBE growth. The system is compared to other RHEED detection devices.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/70680/2/RSINAK-62-5-1263-1.pd
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
International audienceIntensity oscillations of the specular (0,0) RHEED spot during layer-by-layer ...
Reflection High Energy Electron Diffraction (RHEED) is a real-time technique for monitoring the surf...
Abstract − The monitoring of a few critical parameters during epitaxal growth is necessary in order ...
Reflection high energy electron diffraction (RHEED) oscillations recorded during molecular beam epit...
Molecular Beam Epitaxy (MBE) is a versatile technique for growing epitaxial thin films of semiconduc...
This thesis mainly aims at application of principles of engineering technology in the field of molec...
We present a method for measuring molecular‐beam epitaxy growth rates in near real‐time on rotating ...
In this chapter, we present the basic concepts of the low-energy electron diffraction (LEED) and ref...
A suitable in situ monitoring technique for growth of thin films is reflection high energy electron ...
In this chapter, reflection high-energy electron diffraction (RHEED) in combination with pulsed lase...
An all-metal, bakeable, ultra-high vacuum reflection high-energy electron diffraction (UHV RHEED) sy...
A combined molecular‐beam epitaxy and scanning tunneling microscopy system has been constructed. The...
growth chambers worldwide, allowing in-situ monitoring of films grown by molecular beam epitaxy (MBE...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
International audienceIntensity oscillations of the specular (0,0) RHEED spot during layer-by-layer ...
Reflection High Energy Electron Diffraction (RHEED) is a real-time technique for monitoring the surf...
Abstract − The monitoring of a few critical parameters during epitaxal growth is necessary in order ...
Reflection high energy electron diffraction (RHEED) oscillations recorded during molecular beam epit...
Molecular Beam Epitaxy (MBE) is a versatile technique for growing epitaxial thin films of semiconduc...
This thesis mainly aims at application of principles of engineering technology in the field of molec...
We present a method for measuring molecular‐beam epitaxy growth rates in near real‐time on rotating ...
In this chapter, we present the basic concepts of the low-energy electron diffraction (LEED) and ref...
A suitable in situ monitoring technique for growth of thin films is reflection high energy electron ...
In this chapter, reflection high-energy electron diffraction (RHEED) in combination with pulsed lase...
An all-metal, bakeable, ultra-high vacuum reflection high-energy electron diffraction (UHV RHEED) sy...
A combined molecular‐beam epitaxy and scanning tunneling microscopy system has been constructed. The...
growth chambers worldwide, allowing in-situ monitoring of films grown by molecular beam epitaxy (MBE...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
Surface dynamics dominate the temporal variation of reflection high energy electron diffraction (RHE...
International audienceIntensity oscillations of the specular (0,0) RHEED spot during layer-by-layer ...